| 9490157 |
Semiconductor processing |
Jitendra S. Goela, Michael A. Pickering, Melinda S. Strickland |
2016-11-08 |
| 8879246 |
Peripheral data storage device |
Michael Page McGirr |
2014-11-04 |
| 8228670 |
Peripheral storage device |
Michael Page McGirr |
2012-07-24 |
| 8053160 |
Imaging compositions and methods |
Robert K. Barr, Corey O'Connor, James G. Shelnut |
2011-11-08 |
| 8048606 |
Imaging methods |
Robert K. Barr, Corey O'Connor, James G. Shelnut |
2011-11-01 |
| 7977026 |
Imaging methods |
Robert K. Barr, Corey O'Connor, James G. Shelnut |
2011-07-12 |
| 7749685 |
Imaging methods |
Robert K. Barr, Corey O'Connor, James G. Shelnut |
2010-07-06 |
| 7722441 |
Semiconductor processing |
Jitendra S. Goela, Michael A. Pickering, Melinda S. Strickland |
2010-05-25 |
| 7615335 |
Imaging methods |
Robert K. Barr, Corey O'Connor, James G. Shelnut |
2009-11-10 |
| 7270932 |
Imaging composition and method |
Robert K. Barr, Corey O'Connor, James G. Shelnut, John J. Piskorski |
2007-09-18 |
| 6207787 |
Antireflective coating for microlithography |
Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more |
2001-03-27 |
| 6158034 |
Boundary scan method for terminating or modifying integrated circuit operating modes |
Srinivas Ramamurthy, Eugene Jinglun Tam, Geoffrey S. Gongwer |
2000-12-05 |
| 6032279 |
Boundary scan system with address dependent instructions |
Srinivas Ramamurthy, Jinglun Tam, Geoffrey S. Gongwer |
2000-02-29 |
| 5968196 |
Configuration control in a programmable logic device using non-volatile elements |
Srinivas Ramamurthy, Neal Berger, Geoffrey S. Gongwer, William Saiki, Eugene Jinglun Tam |
1999-10-19 |
| 5848026 |
Integrated circuit with flag register for block selection of nonvolatile cells for bulk operations |
Srinivas Ramamurthy, Jinglun Tam, Geoffrey S. Gongwer, Neal Berger, William Saiki |
1998-12-08 |
| 5795701 |
Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound |
Willard E. Conley, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh |
1998-08-18 |
| 5783361 |
Microlithographic structure with an underlayer film containing a thermolyzed azide compound |
Willard E. Conley, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh |
1998-07-21 |
| 5736301 |
Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used |
Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more |
1998-04-07 |
| 5663036 |
Microlithographic structure with an underlayer film comprising a thermolyzed azide |
Willard E. Conley, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh |
1997-09-02 |
| 5607824 |
Antireflective coating for microlithography |
Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Gary T. Spinillo, Kevin M. Welsh +1 more |
1997-03-04 |
| 5554485 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran +3 more |
1996-09-10 |
| 5547812 |
Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer |
James Patrick Collins, Judy B. Dorn, Leo L. Linehan, William J. Miller, Wayne M. Moreau +3 more |
1996-08-20 |
| 5401614 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran +3 more |
1995-03-28 |
