Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6207787 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more | 2001-03-27 |
| 5910337 | Phase-averaging resist coating for reflectivity control | Christopher F. Lyons, Robert L. Wood | 1999-06-08 |
| 5736301 | Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used | James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more | 1998-04-07 |
| 5607824 | Antireflective coating for microlithography | James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more | 1997-03-04 |
| 5561194 | Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene | Kathleen Cornett, Judy B. Dorn, Margaret C. Lawson, Leo L. Linehan, Wayne M. Moreau +1 more | 1996-10-01 |
| 5554485 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more | 1996-09-10 |
| 5547812 | Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer | James Patrick Collins, Judy B. Dorn, James T. Fahey, Leo L. Linehan, William J. Miller +3 more | 1996-08-20 |
| 5482817 | Mid and deep-uv antireflection coatings and methods for use thereof | Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Kevin M. Welsh, Robert L. Wood | 1996-01-09 |
| 5401614 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more | 1995-03-28 |
| 5380621 | Mid and deep-UV antireflection coatings and methods for use thereof | Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Kevin M. Welsh, Robert L. Wood | 1995-01-10 |
| 5273856 | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation | Christopher F. Lyons, Stanley E. Perreault, Robert L. Wood | 1993-12-28 |