| 6207787 |
Antireflective coating for microlithography |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more |
2001-03-27 |
| 5910337 |
Phase-averaging resist coating for reflectivity control |
Christopher F. Lyons, Robert L. Wood |
1999-06-08 |
| 5736301 |
Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more |
1998-04-07 |
| 5607824 |
Antireflective coating for microlithography |
James T. Fahey, Brian Herbst, Leo L. Linehan, Wayne M. Moreau, Kevin M. Welsh +1 more |
1997-03-04 |
| 5561194 |
Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene |
Kathleen Cornett, Judy B. Dorn, Margaret C. Lawson, Leo L. Linehan, Wayne M. Moreau +1 more |
1996-10-01 |
| 5554485 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more |
1996-09-10 |
| 5547812 |
Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer |
James Patrick Collins, Judy B. Dorn, James T. Fahey, Leo L. Linehan, William J. Miller +3 more |
1996-08-20 |
| 5482817 |
Mid and deep-uv antireflection coatings and methods for use thereof |
Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Kevin M. Welsh, Robert L. Wood |
1996-01-09 |
| 5401614 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau +3 more |
1995-03-28 |
| 5380621 |
Mid and deep-UV antireflection coatings and methods for use thereof |
Robert R. Dichiara, Christopher F. Lyons, Ratnasabapathy Sooriyakumaran, Kevin M. Welsh, Robert L. Wood |
1995-01-10 |
| 5273856 |
Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
Christopher F. Lyons, Stanley E. Perreault, Robert L. Wood |
1993-12-28 |
