Issued Patents All Time
Showing 1–25 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12339583 | Optimization using a non-uniform illumination intensity profile | Janardan Nath, Christopher Mason, Todd R. Downey, Tian Gang | 2025-06-24 |
| 12222656 | Method for determining aberration sensitivity of patterns | Jingjing Liu, Xingyue PENG | 2025-02-11 |
| 12210291 | Aberration impact systems, models, and manufacturing processes | Xingyue PENG, Zhan Shi, Rafael C. Howell, Gerui LIU | 2025-01-28 |
| 12092963 | Method of determining characteristic of patterning process based on defect for reducing hotspot | Xingyue PENG, Rafael C. Howell, Qinglin Li | 2024-09-17 |
| 11977334 | Wavefront optimization for tuning scanner based on performance matching | Christoph Rene Konrad Cebulla Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Li, Frank Staals | 2024-05-07 |
| 11892776 | Imaging via zeroth order suppression | Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Frank Jan TIMMERMANS, Marie-Claire VAN LARE | 2024-02-06 |
| 11886124 | Flows of optimization for patterning processes | — | 2024-01-30 |
| 11846889 | Method and apparatus for diffraction pattern guided source mask optimization | Dezheng SUN | 2023-12-19 |
| 11815808 | Method for high numerical aperture thru-slit source mask optimization | Kars Zeger Troost, Eelco Van Setten | 2023-11-14 |
| 11747739 | Method and apparatus for imaging using narrowed bandwidth | Willard E. Conley, Joshua Jon Thornes | 2023-09-05 |
| 11681849 | Method for optimizing a patterning device pattern | Xiaoyang Li | 2023-06-20 |
| 11586114 | Wavefront optimization for tuning scanner based on performance matching | Christoph Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Li, Frank Staals | 2023-02-21 |
| 11506984 | Simulation of lithography using multiple-sampling of angular distribution of source radiation | Rafael C. Howell, Jianjun Jia | 2022-11-22 |
| 11487198 | Patterning device, a method of making the same, and a patterning device design method | Jingjing Liu | 2022-11-01 |
| 11480882 | Flows of optimization for patterning processes | — | 2022-10-25 |
| 11137690 | Flows of optimization for patterning processes | — | 2021-10-05 |
| 11126077 | Patterning device, a method of making the same, and a patterning device design method | Jingjing Liu | 2021-09-21 |
| 11086230 | Method and apparatus for source mask optimization configured to increase scanner throughput for a patterning process | Jingjing Liu | 2021-08-10 |
| 11054750 | Profile aware source-mask optimization | Rafael C. Howell, Feng-Liang Liu | 2021-07-06 |
| 11022894 | Rule-based deployment of assist features | Kurt E. Wampler | 2021-06-01 |
| 10990003 | Binarization method and freeform mask optimization flow | Jingjing Liu, Rafael C. Howell, Xingyue PENG | 2021-04-27 |
| 10955755 | Optimization of assist features and source | Feng-Liang Liu | 2021-03-23 |
| 10796063 | Mapping of patterns between design layout and patterning device | Jingjing Liu | 2020-10-06 |
| 10670973 | Coloring aware optimization | Yi Zou, Jing Su, Robert John Socha, Christopher A. Spence | 2020-06-02 |
| 10509310 | Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devices | Frank Arnoldus Johannes Maria Driessen | 2019-12-17 |