CH

Christoph Hennerkes

CG Carl Zeiss Smt Gmbh: 9 patents #162 of 1,189Top 15%
AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
📍 Leverkusen, CA: #3 of 10 inventorsTop 30%
Overall (All Time): #406,317 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
11733615 Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method Frank Staals 2023-08-22
11586114 Wavefront optimization for tuning scanner based on performance matching Duan-Fu Stephen Hsu, Rafael C. Howell, Zhan Shi, Xiaoyang Li, Frank Staals 2023-02-21
11422472 Patterning process improvement involving optical aberration Paulus Jacobus Maria VAN ADRICHEM, Ahmad Wasiem Ibrahim El-Said, Johannes Christiaan Maria Jasper 2022-08-23
10394128 Method for predicting at least one illumination parameter for evaluating an illumination setting Ralf Gehrke, Wolfgang Hoegele, Joerg Zimmermann 2019-08-27
10078267 Method for predicting at least one illumination parameter for evaluating an illumination setting Ralf Gehrke, Wolfgang Hoegele, Joerg Zimmermann 2018-09-18
9955563 EUV light source for generating a usable output beam for a projection exposure apparatus Ingo Saenger, Manfred Maul, Johannes Ruoff, Daniel Kraehmer 2018-04-24
9678432 Optical assembly for increasing the etendue Ingo Saenger 2017-06-13
9645503 Collector Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier +2 more 2017-05-09
9551941 Illumination system for an EUV lithography device and facet mirror therefor Johannes Ruoff, Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Frank Schlesener 2017-01-24
9507269 Illumination optical unit for projection lithography Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener 2016-11-29
9500956 Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener 2016-11-22
9405202 Optical system of a microlithographic projection exposure apparatus Ingo Saenger 2016-08-02