Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444631 | Method of operating a microlithographic projection apparatus and illumination system of such an apparatus | Markus Deguenther, Johannes Eisenmenger, Stefanie Hilt, Thomas Korb, Manfred Maul | 2019-10-15 |
| 10222704 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Oliver Natt | 2019-03-05 |
| 10088754 | Illumination system for microlithography | Axel Scholz, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2018-10-02 |
| 9983483 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Stig Bieling, Markus Deguenther, Markus Schwab | 2018-05-29 |
| 9910359 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Vladimir Davydenko, Thomas Korb, Stefanie Hilt, Wolfgang Hoegele | 2018-03-06 |
| 9817317 | Optical system of a microlithographic projection exposure apparatus | Ingo Saenger | 2017-11-14 |
| 9798249 | Method and apparatus for compensating at least one defect of an optical system | Vladimir Dmitriev, Ingo Saenger, Markus Mengel, Johannes Ruoff | 2017-10-24 |
| 9753375 | Illumination optical unit for projection lithography | Axel Scholz, Michael Patra, Manfred Maul, Wolfgang Emer, Stefanie Hilt | 2017-09-05 |
| 9703205 | Measuring an optical symmetry property on a projection exposure apparatus | Jens Timo Neumann | 2017-07-11 |
| 9703206 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Oliver Natt | 2017-07-11 |
| 9665008 | Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography | Ingo Saenger | 2017-05-30 |
| 9645503 | Collector | Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier +2 more | 2017-05-09 |
| 9632413 | Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system | Ingo Saenger | 2017-04-25 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2017-03-28 |
| 9581910 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Ingo Saenger, Olaf Dittmann, Aksel Goehnermeier, Alexandra Pazidis, Thomas Schicketanz +2 more | 2017-02-28 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Ingo Saenger, Joerg Zimmermann, Daniel Kraehmer, Christoph Hennerkes | 2017-01-24 |
| 9507269 | Illumination optical unit for projection lithography | Christoph Hennerkes, Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier | 2016-11-29 |
| 9500956 | Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure | Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Christoph Hennerkes | 2016-11-22 |
| 9500954 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Vladimir Davydenko, Thomas Korb, Stefanie Hilt, Wolfgang Hoegele | 2016-11-22 |
| 9488918 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger | 2016-11-08 |
| 9477157 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Stig Bieling, Markus Deguenther, Markus Schwab | 2016-10-25 |
| 9442385 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger | 2016-09-13 |
| 9411245 | Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus | Ingo Saenger | 2016-08-09 |
| 9341957 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Oliver Natt | 2016-05-17 |
| 9310690 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Vladimir Davydenko, Thomas Korb, Stefanie Hilt, Wolfgang Hoegele | 2016-04-12 |