Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11169445 | Pupil facet mirror, optical system and illumination optics for a projection lithography system | Martin Endres, Thomas Fischer | 2021-11-09 |
| 11003086 | Illumination optical device for projection lithography | Markus Deguenther | 2021-05-11 |
| 10948828 | Illumination optical element for projection lithography | Markus Deguenther | 2021-03-16 |
| 10599041 | Facet mirror | Markus Deguenther, Johannes Wangler | 2020-03-24 |
| 10409167 | Method for illuminating an object field of a projection exposure system | Martin Endres, Johannes Eisenmenger, Markus Hauf, Lars Wischmeier, Fabian Haacker | 2019-09-10 |
| 10394129 | Microlithographic illumination unit | Markus Deguenther | 2019-08-27 |
| 10324380 | Projection exposure apparatus and method for measuring an imaging aberration | Helmut Haidner | 2019-06-18 |
| 10146136 | Reflecting coating with optimized thickness | Martin Endres, Hartmut Enkisch | 2018-12-04 |
| 10133182 | Illumination optical assembly for a projection exposure apparatus | Martin Endres | 2018-11-20 |
| 10018917 | Illumination optical unit for EUV projection lithography | Martin Endres, Markus Deguenther, Michael Patra, Johannes Wangler | 2018-07-10 |
| 9983483 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Markus Deguenther, Frank Schlesener, Markus Schwab | 2018-05-29 |
| 9983484 | Illumination optical unit for EUV projection lithography | Martin Endres, Ralf Mueller | 2018-05-29 |
| 9983482 | Radiation collector, radiation source and lithographic apparatus | Erik Roelof Loopstra, Olav Waldemar Vladimir Frijns, Antonius Theodorus Wilhelmus Kempen, Ivo Vanderhallen, Nicolaas Ten Kate +6 more | 2018-05-29 |
| 9874819 | Mirror array | Markus Hauf, Lars Wischmeier, Fabian Haacker, Martin Endres, Johannes Eisenmenger | 2018-01-23 |
| 9791784 | Assembly for a projection exposure apparatus for EUV projection lithography | Michael Patra, Markus Deguenther, Johannes Wangler | 2017-10-17 |
| 9477157 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Markus Deguenther, Frank Schlesener, Markus Schwab | 2016-10-25 |
| 9046786 | Illumination system of a microlithographic projection exposure apparatus | Michael Patra, Markus Deguenther, Frank Schlesener, Markus Schwab | 2015-06-02 |
| 8395754 | Illumination optical unit for EUV microlithography | Martin Endres, Sebastian Doern, Marc Kirch | 2013-03-12 |
| 8345219 | Method and apparatus for setting an illumination optical unit | Joachim Hartjes, Artur Hoegele | 2013-01-01 |
| 8294877 | Illumination optical unit for projection lithography | Johannes Wangler, Markus Deguenther | 2012-10-23 |