Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11260483 | Apparatus for supporting at least one component | Christian Auer, Franz KORBER, Georgij SAFRONOV | 2022-03-01 |
| 11169445 | Pupil facet mirror, optical system and illumination optics for a projection lithography system | Stig Bieling, Thomas Fischer | 2021-11-09 |
| 10877379 | Illumination intensity correction device for specifying an illumination intensity over an illumination field of a lithographic projection exposure apparatus | Ramon Pascal Van Gorkom | 2020-12-29 |
| 10409167 | Method for illuminating an object field of a projection exposure system | Johannes Eisenmenger, Stig Bieling, Markus Hauf, Lars Wischmeier, Fabian Haacker | 2019-09-10 |
| 10146136 | Reflecting coating with optimized thickness | Hartmut Enkisch, Stig Bieling | 2018-12-04 |
| 10133182 | Illumination optical assembly for a projection exposure apparatus | Stig Bieling | 2018-11-20 |
| 10067424 | Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus | Toralf Gruner | 2018-09-04 |
| 10018917 | Illumination optical unit for EUV projection lithography | Stig Bieling, Markus Deguenther, Michael Patra, Johannes Wangler | 2018-07-10 |
| 9996010 | Illumination optical assembly for projection lithography | — | 2018-06-12 |
| 9996012 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Armin Werber, Norbert Muehlberger, Florian Bach | 2018-06-12 |
| 9983484 | Illumination optical unit for EUV projection lithography | Ralf Mueller, Stig Bieling | 2018-05-29 |
| 9977335 | Illumination optical unit for projection lithography | — | 2018-05-22 |
| 9921484 | Illumination system and illumination optical unit for EUV projection lithography | — | 2018-03-20 |
| 9915875 | Illumination optical assembly for projection lithography | — | 2018-03-13 |
| 9897923 | Micromirror array | — | 2018-02-20 |
| 9897924 | Illumination optical unit for projection lithography | — | 2018-02-20 |
| 9891530 | Illumination optical unit | Michael Patra | 2018-02-13 |
| 9874819 | Mirror array | Stig Bieling, Markus Hauf, Lars Wischmeier, Fabian Haacker, Johannes Eisenmenger | 2018-01-23 |
| 9754695 | EUV collector | — | 2017-09-05 |
| 9678439 | Mirror | Ingo Saenger, Johannes Ruoff, Thomas Eisenmann | 2017-06-13 |
| 9671608 | Illumination system for EUV lithography | Jens Ossmann | 2017-06-06 |
| 9632422 | Illumination optical unit | — | 2017-04-25 |
| 9588434 | Catoptric illumination system for microlithography tool | Jens Ossmann, Ralf Stuetzle | 2017-03-07 |
| 9411241 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Armin Werber, Norbert Muehlberger, Florian Bach | 2016-08-09 |
| 9341958 | Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror | Hartmut Enkisch, Stephan Muellender | 2016-05-17 |