Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9996012 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger | 2018-06-12 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9535336 | Microlithographic projection exposure apparatus | Sascha Bleidistel, Yim-Bun Patrick Kwan, Daniel Benz, Severin Waldis, Armin Werber | 2017-01-03 |
| 9523922 | Illumination system of a microlithographic projection exposure apparatus having a temperature control device | Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm | 2016-12-20 |
| 9448384 | Arrangement for mounting an optical element | Michael Erath, Ulrich Schoenhoff, Rodolfo Rabe, Norbert Muehlberger, Dirk Eicher +1 more | 2016-09-20 |
| 9411241 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger | 2016-08-09 |
| 9274434 | Light modulator and illumination system of a microlithographic projection exposure apparatus | Armin Werber, Severin Waldis | 2016-03-01 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013676 | Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography | Armin Werber, Norbert Muehlberger | 2015-04-21 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8797507 | Illumination system of a microlithographic projection exposure apparatus having a temperature control device | Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm | 2014-08-05 |
| 8767176 | Microlithographic projection exposure apparatus | Sascha Bleidistel, Yim-Bun Patrick Kwan, Daniel Benz, Severin Waldis, Armin Werber | 2014-07-01 |
| 8717531 | Mirror for guiding a radiation bundle | Severin Waldis, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm +2 more | 2014-05-06 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2012-12-25 |
| 8102506 | Method and device for controlling a plurality of actuators and an illumination device for lithography | Thomas Rohe, Juergen Fischer | 2012-01-24 |