Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12293896 | Particle beam system | Dirk Zeidler, Hans Fritz, Ingo Mueller, Stefan Schubert, Arne Thoma | 2025-05-06 |
| 12249478 | Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system | Hans Fritz, Dirk Zeidler, Arne Thoma, Joerg Jacobi | 2025-03-11 |
| 10161808 | Method and arrangement for determining the heating condition of a mirror in an optical system | Peter Vogt, Martin Hermann, Oliver Dier | 2018-12-25 |
| 9946161 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Ingo Saenger, Ralf Scharnweber, Olaf Dittmann, Toralf Gruner, Gundula Weiss +5 more | 2018-04-17 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2018-02-20 |
| 9310701 | Device for guiding electromagnetic radiation into a projection exposure apparatus | — | 2016-04-12 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |
| 9052606 | Microlithographic projection exposure apparatus | Manfred Maul, Gundula Weiss, Jochen Hetzler | 2015-06-09 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-28 |
| 9013680 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Ralf Mueller | 2015-04-21 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-07 |
| 8854604 | Microlithographic projection exposure apparatus | Markus Deguenther, Michael Patra | 2014-10-07 |
| 8773639 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Anne Christine Andresen | 2014-07-08 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2012-12-25 |
| 8164046 | Illumination system for illuminating a mask in a microlithographic projection exposure apparatus | — | 2012-04-24 |
| 7782443 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Ralf Mueller | 2010-08-24 |