Issued Patents All Time
Showing 1–25 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10151982 | Illumination system of a microlithographic projection exposure apparatus with a birefringent element | Daniel Walldorf, Ingo Saenger | 2018-12-11 |
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul +1 more | 2018-12-04 |
| 9933706 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Gerhard-Wilhelm Ziegler | 2018-04-03 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9778576 | Microlithography illumination system and microlithography illumination optical unit | Michael Totzeck, Hartmut Enkisch, Stephan Muellender | 2017-10-03 |
| 9588435 | EUV microlithography projection exposure apparatus with a heat light source | — | 2017-03-07 |
| 9581911 | Polarization-modulating optical element | Markus Deguenther | 2017-02-28 |
| 9454085 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Gerhard-Wilhelm Ziegler | 2016-09-27 |
| 9423590 | Liquid cooled EUV reflector | Joachim Hartjes, Boaz Pnini-Mittler | 2016-08-23 |
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter | 2016-07-05 |
| 9316920 | Illumination system of a microlithographic projection exposure apparatus with a birefringent element | Daniel Walldorf, Ingo Saenger | 2016-04-19 |
| 9316772 | Producing polarization-modulating optical element for microlithography system | Markus Deguenther | 2016-04-19 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Michael Totzeck, Hartmut Enkisch, Stephan Muellender | 2016-04-05 |
| 9304400 | Illumination system for EUV microlithography | Michael Layh, Ralf Stuetzle, Martin Endres, Holger Weigand | 2016-04-05 |
| 9274435 | Illumination system or projection objective of a microlithographic projection exposure apparatus | Nils Dieckmann | 2016-03-01 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9235137 | Illumination optical unit for microlithography | Ralf Stuetzle | 2016-01-12 |
| 9213245 | Optical system and multi facet mirror of a microlithographic projection exposure apparatus | Juergen Baier | 2015-12-15 |
| 9170499 | Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element | Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2015-10-27 |
| 9128389 | Method for modifying a polarization distribution in microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus | — | 2015-09-08 |
| 9091945 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Gerhard-Wilhelm Ziegler | 2015-07-28 |
| 9063336 | Optical element having a plurality of reflective facet elements | Marc Kirch, Martin Endres, Joachim Hartjes | 2015-06-23 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9013680 | Illumination system of a microlithographic projection exposure apparatus | Ralf Mueller, Andras G. Major | 2015-04-21 |