Issued Patents All Time
Showing 1–25 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444631 | Method of operating a microlithographic projection apparatus and illumination system of such an apparatus | Markus Deguenther, Johannes Eisenmenger, Stefanie Hilt, Thomas Korb, Frank Schlesener | 2019-10-15 |
| 10247949 | Method for adjusting a display device | Ersun Kartal, Karsten Lindig, Torsten Braendle, Norbert Kerwien | 2019-04-02 |
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Damian Fiolka +1 more | 2018-12-04 |
| 10088754 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2018-10-02 |
| 10054786 | Correction of optical elements by correction light irradiated in a flat manner | Sascha Bleidistel | 2018-08-21 |
| 9995938 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image | Lisa Riedel, Hans-Juergen Dobschal, Gerhard Kelch, Wolf Krause, Karsten Lindig +4 more | 2018-06-12 |
| 9964856 | Illumination optical unit for projection lithography | — | 2018-05-08 |
| 9955563 | EUV light source for generating a usable output beam for a projection exposure apparatus | Ingo Saenger, Christoph Hennerkes, Johannes Ruoff, Daniel Kraehmer | 2018-04-24 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2018-02-20 |
| 9766553 | Illumination optical unit for projection lithography | — | 2017-09-19 |
| 9753375 | Illumination optical unit for projection lithography | Axel Scholz, Michael Patra, Frank Schlesener, Wolfgang Emer, Stefanie Hilt | 2017-09-05 |
| 9746779 | Illumination optical unit for projection lithography | — | 2017-08-29 |
| 9720327 | Optical system of a microlithographic projection exposure apparatus | — | 2017-08-01 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2017-03-28 |
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Markus Deguenther +4 more | 2017-02-21 |
| 9366857 | Correction of optical elements by correction light irradiated in a flat manner | Sascha Bleidistel | 2016-06-14 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2016-03-08 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |
| 9217930 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Markus Deguenther +4 more | 2015-12-22 |
| 9170499 | Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element | Damian Fiolka, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2015-10-27 |
| 9116441 | Illumination system of a microlithographic projection exposure apparatus | Nils Dieckmann, Christian Hettich, Oliver Natt | 2015-08-25 |
| 9052606 | Microlithographic projection exposure apparatus | Andras G. Major, Gundula Weiss, Jochen Hetzler | 2015-06-09 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-07 |