Issued Patents All Time
Showing 1–25 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11703770 | Compensation of creep effects in an imaging device | Eylem Bektas Knauf, Ulrich Schoenhoff, Marwene Nefzi, Ralf Zweering, Konrad Carl Steimer | 2023-07-18 |
| 11656453 | Optical imaging arrangement with a piezoelectric device | Axel Lorenz, Jasper Wesselingh | 2023-05-23 |
| 10732402 | Optical imaging arrangement with a piezoelectric device | Axel Lorenz, Jasper Wesselingh | 2020-08-04 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2020-06-16 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2019-06-11 |
| 10197925 | Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner | Jens Kugler, Franz Sorg | 2019-02-05 |
| 10175581 | Optical apparatus with adjustable action of force on an optical module | — | 2019-01-08 |
| 10139733 | Diaphragm changing device | Hermann Bieg, Marcus Will, Thomas C. Bischoff, Uy-Liem Nguyen, Stefan Xalter +1 more | 2018-11-27 |
| 10108094 | Projection exposure apparatus with near-field manipulator | Peter Deufel, Johannes Lippert, Pascal Marsollek, Jasper Wesselingh | 2018-10-23 |
| 10095120 | Vibration-compensated optical system, lithography apparatus and method | Tim Groothuijsen | 2018-10-09 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2018-07-24 |
| 9977228 | Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner | Jens Kugler, Franz Sorg | 2018-05-22 |
| 9976931 | Optical imaging arrangement with multiple metrology support units | Erik Ruinemans | 2018-05-22 |
| 9933707 | Optical apparatus for use in photolithography | Erik Roelof Loopstra | 2018-04-03 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2018-02-20 |
| 9891534 | Optical imaging arrangement with multiple metrology support units | — | 2018-02-13 |
| 9829808 | Method for controlling a motion of optical elements in lithography systems | Dick Antonius Hendrikus Laro | 2017-11-28 |
| 9766549 | Optical apparatus with adjustable action of force on an optical module | — | 2017-09-19 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2017-08-29 |
| 9696630 | Lithographic apparatus and device manufacturing method | Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis +2 more | 2017-07-04 |
| 9551940 | Lens comprising a plurality of optical element disposed in a housing | — | 2017-01-24 |
| 9535336 | Microlithographic projection exposure apparatus | Sascha Bleidistel, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber | 2017-01-03 |
| 9477092 | Optical imaging arrangement with individually actively supported components | — | 2016-10-25 |
| 9436101 | Optical arrangement and microlithographic projection exposure apparatus including same | Armin Schoeppach, Hans-Juergen Mann, Frank Eisert | 2016-09-06 |
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Stefan Xalter, Damian Fiolka | 2016-07-05 |