Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405108 | Production method and measurement method | Hans-Michael Stiepan, Thomas Monz, Julian Kaller | 2025-09-02 |
| 12222655 | Stop, optical system and lithography apparatus | Benjahman Julius Modeste, Toralf Gruner, Daniel Golde, Ralf Zweering, Stefan Xalter | 2025-02-11 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2020-06-16 |
| 10345710 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2019-07-09 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2019-06-11 |
| 10241423 | Method of operating a projection exposure tool for microlithography | Olaf Conradi, Michael Totzeck, Dirk Juergens, Ralf Mueller, Christian Wald | 2019-03-26 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2018-07-24 |
| 9964859 | Lithography projection objective, and a method for correcting image defects of the same | Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2018-05-08 |
| 9921483 | Surface correction of mirrors with decoupling coating | Oliver Dier, Tobias Hackl, Franz-Josef Stickel, Tilmann Assmus, Juergen Mueller +2 more | 2018-03-20 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2017-08-29 |
| 9671703 | Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement | Norman Baer, Toralf Gruner | 2017-06-06 |
| 9442381 | Method of operating a projection exposure tool for microlithography | Olaf Conradi, Michael Totzeck, Dirk Juergens, Ralf Mueller, Christian Wald | 2016-09-13 |
| 9436095 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2016-09-06 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz +7 more | 2016-04-19 |
| 9316922 | Lithography projection objective, and a method for correcting image defects of the same | Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2016-04-19 |
| 9201226 | Imaging optics | Ralf Mueller, Hans-Juergen Mann, Norman Baer | 2015-12-01 |
| 9081310 | Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same | Matthias Exler, Toralf Gruner, Holger Walter | 2015-07-14 |
| 8879159 | Lithography projection objective, and a method for correcting image defects of the same | Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2014-11-04 |
| 8659745 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Dirk Hellweg +7 more | 2014-02-25 |
| 8542346 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Dirk Hellweg +7 more | 2013-09-24 |
| 8488104 | Projection objective with diaphragms | Nils Dieckmann, Alexander Wolf, Christian Holland, Franz Sorg | 2013-07-16 |
| 8339576 | Projection objective of a microlithographic projection exposure apparatus | Vladimir Kamenov, Dirk Heinrich Ehm, Stefan Schmidt, Moritz Becker, Andreas Wurmbrand | 2012-12-25 |
| 8330935 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2012-12-11 |
| 8228483 | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Johann Trenkler, Stefan Kraus +2 more | 2012-07-24 |
| 8054557 | Lithography projection objective, and a method for correcting image defects of the same | Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2011-11-08 |