Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10281824 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc +4 more | 2019-05-07 |
| 10241423 | Method of operating a projection exposure tool for microlithography | Michael Totzeck, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald | 2019-03-26 |
| 9823579 | Optical system and method of use | — | 2017-11-21 |
| 9690203 | Method for adjusting an illumination setting | Joerg Zimmermann, Ralf Stuetzle, Paul Graeupner | 2017-06-27 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Boris Bittner, Martin von Hodenberg, Hartmut Enkisch, Stephan Muellender | 2017-03-28 |
| 9581813 | Method for improving the imaging properties of a projection objective, and such a projection objective | Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner +1 more | 2017-02-28 |
| 9442381 | Method of operating a projection exposure tool for microlithography | Michael Totzeck, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald | 2016-09-13 |
| 9366977 | Semiconductor microlithography projection exposure apparatus | Sascha Bleidistel, Arif Kazi | 2016-06-14 |
| 9146475 | Projection exposure system and projection exposure method | Paul Graupner, Christoph Zaczek, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner +1 more | 2015-09-29 |
| 9097984 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc +4 more | 2015-08-04 |
| 9069263 | Method for improving the imaging properties of a projection objective, and such a projection objective | Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner +1 more | 2015-06-30 |
| 8947633 | Optical system and method of use | — | 2015-02-03 |
| 8773638 | Microlithographic projection exposure apparatus with correction optical system that heats projection objective element | Aurelian Dodoc, Sascha Bleidistel, Arif Kazi | 2014-07-08 |
| 8462315 | Optical system and method of use | — | 2013-06-11 |
| 8325323 | Method and system for correcting image changes | Toralf Gruner | 2012-12-04 |
| 7990622 | Projection objective of a microlithographic projection exposure apparatus | Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi +4 more | 2011-08-02 |
| 7830611 | Projection objective of a microlithographic projection exposure apparatus | Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer +4 more | 2010-11-09 |
| 7808615 | Projection exposure apparatus and method for operating the same | Toralf Gruner, Nils Dieckmann, Markus Schwab, Olaf Dittmann, Michael Totzeck +2 more | 2010-10-05 |
| 7777963 | Method for improving the imaging properties of a projection objective, and such a projection objective | Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner +1 more | 2010-08-17 |