Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11366382 | Method and apparatus for performing an aerial image simulation of a photolithographic mask | Vladimir Dmitriev, Joachim Welte, Bernd Geh, Anja Schauer | 2022-06-21 |
| 9885958 | Projection exposure methods and systems | — | 2018-02-06 |
| 9690203 | Method for adjusting an illumination setting | Joerg Zimmermann, Ralf Stuetzle, Olaf Conradi | 2017-06-27 |
| 8917379 | Projection exposure methods and systems | — | 2014-12-23 |
| 8711330 | Lithographic apparatus and device manufacturing method | Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Johannes Catharinus Hubertus Mulkens +1 more | 2014-04-29 |
| 8605257 | Projection system with compensation of intensity variations and compensation element therefor | Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann +2 more | 2013-12-10 |
| 8416390 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Markus Deguenther, Juergen Fischer | 2013-04-09 |
| 8405907 | Method for correcting optical proximity effects | — | 2013-03-26 |
| 8237915 | Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus | — | 2012-08-07 |
| 8027091 | Method for correcting optical proximity effects | — | 2011-09-27 |
| 7961293 | Lithographic apparatus and device manufacturing method | Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Johannes Catharinus Hubertus Mulkens +1 more | 2011-06-14 |
| 7800732 | Projection exposure method and projection exposure apparatus for microlithography | Joerg Zimmermann, Heiko Feldmann, Tilmann Heil, Ulrich Gebhardt | 2010-09-21 |
| 7649702 | Immersion lithography objective | Bernhard Gellrich, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk +2 more | 2010-01-19 |
| 7570345 | Method of optimizing imaging performance | Gerd Reisinger, Manfred Maul, Martin Schriever, Ulrich Wegmann | 2009-08-04 |
| 7352435 | Lithographic apparatus and device manufacturing method | Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Johannes Catharinus Hubertus Mulkens +1 more | 2008-04-01 |
| 7310187 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Alexander Epple, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich | 2007-12-18 |
| 7233386 | Method of optimizing imaging performance | Gerd Reisinger, Manfred Maul, Martin Schriever, Ulrich Wegmann | 2007-06-19 |
| 7227616 | Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus | — | 2007-06-05 |
| 7209241 | Method for determining wavefront aberrations | Wolfgang Emer | 2007-04-24 |
| 7209292 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Alexander Epple, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich | 2007-04-24 |
| 7019846 | Method for determining wavefront aberrations | Wolfgang Emer | 2006-03-28 |