Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11366382 | Method and apparatus for performing an aerial image simulation of a photolithographic mask | Vladimir Dmitriev, Joachim Welte, Paul Graeupner, Anja Schauer | 2022-06-21 |
| 10852643 | Optical system, and method | Dirk Juergens, Kerstin Hild | 2020-12-01 |
| 10607873 | Substrate edge detection | Eric Anthony Janda, Cayetano Sanchez-Fabres Cobaleda, Simon Gijsbert Josephus Mathijssen | 2020-03-31 |
| 10353295 | Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer | Vladimir Dmitriev | 2019-07-16 |
| 9568838 | Projection objective for microlithography | — | 2017-02-14 |
| 9217932 | Projection objective for microlithography | — | 2015-12-22 |
| 8339574 | Lithographic apparatus and device manufacturing method | Michael Totzeck, Skip Miller | 2012-12-25 |
| 8212988 | Projection objective for microlithography | — | 2012-07-03 |
| 8120748 | Lithographic processing optimization based on hypersampled correlations | Roger Irwin, Eric Anthony Janda, David M. Phillips | 2012-02-21 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Michael Totzeck, Vladimir Kamenov +3 more | 2011-06-14 |
| 7952685 | Illuminator for a lithographic apparatus and method | Michel Fransois Hubert Klaassen, Hendrikus Robertus Marie Van Greevenbroek, Emil Peter Schmitt-Weaver | 2011-05-31 |
| 7818151 | Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool | Tamer Coskun, Sangbong Park, Jang Fung Chen | 2010-10-19 |
| 7684013 | Lithographic apparatus and device manufacturing method | Steven George Hansen, Donis Flagello, Wolfgang Singer, Vladan Blahnik | 2010-03-23 |
| 7581305 | Method of manufacturing an optical component | Bernhard Geuppert, Jens Kugler, Thomas Ittner, Rolf Freimann, Guenther Seitz +3 more | 2009-09-01 |
| 7423727 | Lithographic apparatus and device manufacturing method | Michael Totzeck, Skip Miller | 2008-09-09 |
| 7301622 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Paul Graupner, Thomas Stammler, Dirk Stenkamp, Jochen Stuhler, Klaus Wurmbrand | 2007-11-27 |
| 7198873 | Lithographic processing optimization based on hypersampled correlations | Roger Irwin, Eric Anthony Janda, David M. Phillips | 2007-04-03 |
| 6934011 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Paul Graupner, Thomas Stammler, Dirk Stenkamp, Jochen Stuhler, Klaus Wurmbrand | 2005-08-23 |
| 6678240 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Paul Graupner, Klaus Wurmbrand, Thomas Stammler, Dirk Stenkamp, Jochen Stuhler | 2004-01-13 |