Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12411417 | Projection objective including an optical device | Johannes Lippert, Toralf Gruner, Hans-Michael Stiepan, Thilo Pollak, Jeffrey Cavaco | 2025-09-09 |
| 12276917 | Mirror, in particular for microlithography | Jan Horn, Mohammad Awad | 2025-04-15 |
| 12210289 | Mirror, in particular for a microlithographic projection exposure apparatus | Toralf Gruner, Daniel Golde, Hans-Michael Stiepan, Vitaliy Shklover | 2025-01-28 |
| 11366395 | Mirror, in particular for a microlithographic projection exposure system | Toralf Gruner, Vitaliy Shklover | 2022-06-21 |
| 11360393 | Mirror, in particular for a microlithographic projection exposure system | Ben Wylie-Van Eerd, Frederik Bijkerk, Toralf Gruner, Stefan Schulte, Simone Weyler | 2022-06-14 |
| 11328831 | Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus | Christian Grasse, Martin Hermann, Stephan Six, Joern WEBER, Ralf Winter +3 more | 2022-05-10 |
| 11187990 | Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror | Johannes Lippert, Toralf Gruner, Philip Lucke, Mohammadreza Nematollahi | 2021-11-30 |
| 11137687 | Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma | Bjoern Liebaug, Moritz Becker, Joachim Hartjes, Simon Haas | 2021-10-05 |
| 11029515 | Optical element, and method for correcting the wavefront effect of an optical element | Toralf Gruner, Vitaliy Shklover | 2021-06-08 |
| 10908509 | Mirror, in particular for a microlithographic projection exposure apparatus | Johannes Lippert, Toralf Gruner | 2021-02-02 |
| 10852643 | Optical system, and method | Dirk Juergens, Bernd Geh | 2020-12-01 |
| 10684466 | Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement | Wouter Bernardus Johannes Hakvoort, Richard Petrus Hogervorst, Petrus Theodorus Rutgers, Toralf Gruner | 2020-06-16 |
| 10331048 | Mirror, in particular for a microlithographic projection exposure apparatus | Oliver Dier, Hartmut Enkisch, Matus Kalisky | 2019-06-25 |
| 10146138 | Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus | Franz-Josef Stickel, Robert Fichtl, Joachim Hartjes | 2018-12-04 |
| 9785054 | Mirror, more particularly for a microlithographic projection exposure apparatus | Toralf Gruner | 2017-10-10 |