Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12222655 | Stop, optical system and lithography apparatus | Benjahman Julius Modeste, Toralf Gruner, Ulrich Loering, Ralf Zweering, Stefan Xalter | 2025-02-11 |
| 12210289 | Mirror, in particular for a microlithographic projection exposure apparatus | Kerstin Hild, Toralf Gruner, Hans-Michael Stiepan, Vitaliy Shklover | 2025-01-28 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Toralf Gruner, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer +1 more | 2020-03-17 |
| 10048592 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Toralf Gruner, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer +1 more | 2018-08-14 |
| 9933710 | Projection exposure method and projection exposure apparatus | Stephan Andre, Toralf Gruner, Johannes Ruoff | 2018-04-03 |