Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12222655 | Stop, optical system and lithography apparatus | Benjahman Julius Modeste, Toralf Gruner, Daniel Golde, Ulrich Loering, Ralf Zweering | 2025-02-11 |
| 11281114 | Projection exposure apparatus for semiconductor lithography | Jens Kugler, Mark Feygin, Bernhard Gellrich, Stefan Hembacher | 2022-03-22 |
| 10571813 | Connection arrangement for a force-fit connection between ceramic components | Karsten Siegmanski, Peter Deufel, Viktor Kulitzki, Bernhard Gellrich | 2020-02-25 |
| 10139733 | Diaphragm changing device | Hermann Bieg, Marcus Will, Thomas C. Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen +1 more | 2018-11-27 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2018-02-20 |
| 9804500 | Optical imaging arrangement with simplified manufacture | Jens Kugler, Jens Prochnau | 2017-10-31 |
| 9383544 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Damian Fiolka | 2016-07-05 |
| 9316930 | Low-contamination optical arrangement | Yim-Bun Patrick Kwan | 2016-04-19 |
| 9298111 | Optical arrangement in a projection exposure apparatus for EUV lithography | Viktor Kulitzki, Bernhard Gellrich, Yim-Bun Patrick Kwan, Peter Deufel, Andreas Wurmbrand | 2016-03-29 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-07 |
| 8659745 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2014-02-25 |
| 8570676 | Optical assembly | Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Martin Schmidt, Saverio Sanvido +1 more | 2013-10-29 |
| 8542346 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2013-09-24 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2012-12-25 |
| 8269947 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Damian Fiolka | 2012-09-18 |
| 8089707 | Diaphragm changing device | Hermann Bieg, Marcus Will, Thomas C. Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen +1 more | 2012-01-03 |
| 8018664 | Housing structure | Peter Deufel, Yim-Bun Patrick Kwan, Bernard Stommen, Herman Soemers, Franz Van Deuren +1 more | 2011-09-13 |
| 7929227 | Optical assembly | Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Martin Schmidt, Saverio Sanvido +1 more | 2011-04-19 |
| 7791826 | Optical assembly | Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Martin Schmidt, Saverio Sanvido +1 more | 2010-09-07 |
| 7760327 | Reflecting optical element with eccentric optical passageway | Hans-Jürgen Scherle, Yim-Bun Patrick Kwan, Johannes Lippert, Ulrich Weber, Bernhard Geuppert +8 more | 2010-07-20 |
| 7684125 | Diaphragm changing device | Hermann Bieg, Thomas C. Bischoff, Uy-Liem Nguyen, Marcus Will, Yim-Bum Patrick Kwan +1 more | 2010-03-23 |
| 7589921 | Actuator device | Yim-Bun Patrick Kwan | 2009-09-15 |