Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10663873 | Mirror arrangement for microlithographic projection exposure apparatus and related method | Willi Heintel | 2020-05-26 |
| 10606179 | Projection exposure apparatus for semiconductor lithography with reduce thermal deformation | — | 2020-03-31 |
| 10139733 | Diaphragm changing device | Marcus Will, Thomas C. Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter +1 more | 2018-11-27 |
| 9341955 | Optical aperture device | Uy-Liem Nguyen | 2016-05-17 |
| 8687169 | Optical aperture device | Uy-Liem Nguyen | 2014-04-01 |
| 8570676 | Optical assembly | Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido +1 more | 2013-10-29 |
| 8089707 | Diaphragm changing device | Marcus Will, Thomas C. Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter +1 more | 2012-01-03 |
| 8009343 | Optical imaging device having at least one system diaphragm | Bernhard Gellrich, Thomas C. Bischoff, Martin Huber, Francois Henzelin, Gerhard Szekely +2 more | 2011-08-30 |
| 7929227 | Optical assembly | Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido +1 more | 2011-04-19 |
| 7791826 | Optical assembly | Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido +1 more | 2010-09-07 |
| 7763870 | Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements | Dirk Heinrich Ehm, Hans-Juergen Mann, Stephan Muellender, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn | 2010-07-27 |
| 7684125 | Diaphragm changing device | Thomas C. Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bum Patrick Kwan +1 more | 2010-03-23 |