Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9996005 | Reflective optical element and optical system for EUV lithography | Dirk Heinrich Ehm, Peter Huber, Gisela Von Blanckenhagen | 2018-06-12 |
| 9778576 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Michael Totzeck, Hartmut Enkisch | 2017-10-03 |
| 9720329 | Projection objective of a microlithographic projection exposure apparatus | Hartmut Enkisch, Hans-Juergen Mann, Rolf Freimann | 2017-08-01 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Boris Bittner, Martin von Hodenberg, Hartmut Enkisch, Olaf Conradi | 2017-03-28 |
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun, Sascha Migura +4 more | 2016-11-15 |
| 9341958 | Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror | Hartmut Enkisch, Martin Endres | 2016-05-17 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Michael Totzeck, Hartmut Enkisch | 2016-04-05 |
| 9285515 | Imaging optical system and projection exposure system including the same | Hans-Juergen Mann, Wilheim Ulrich, Hartmut Enkisch | 2016-03-15 |
| 8944615 | Projection objective and method for its manufacture | Hans-Juergen Mann, Johann Trenkler, Harmut Enkisch | 2015-02-03 |
| 8605255 | Imaging optical system and projection exposure system including the same | Hans-Juergen Mann, Wilhelm Ulrich, Hartmut Enkisch | 2013-12-10 |
| 8585224 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Dirk Heinrich Ehm, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more | 2013-11-19 |
| 8457281 | Method for producing a multilayer coating, optical element and optical arrangement | Hartmut Enkisch, Martin Endres | 2013-06-04 |
| 8382301 | Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination | Dirk Heinrich Ehm, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus +2 more | 2013-02-26 |
| 8164077 | Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element | Marco Wedowski, Markus Weiss, Johann Trenkler, Hartmut Enkisch, Gisela Sipos +3 more | 2012-04-24 |
| 7763870 | Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements | Dirk Heinrich Ehm, Hermann Bieg, Hans-Juergen Mann, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn | 2010-07-27 |
| 7429116 | Projection objective and method for its manufacture | Hans-Juergen Mann, Johann Trenkler, Hartmut Enkisch | 2008-09-30 |