Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Hans-Jochen Paul, Gerhard Braun, Sascha Migura +4 more | 2016-11-15 |
| 9459538 | Lithography apparatus and method for producing a mirror arrangement | Dirk Schaffer, Hin Yiu Anthony Chung | 2016-10-04 |
| 9263161 | Optical arrangement for EUV lithography and method for configuring such an optical arrangement | — | 2016-02-16 |
| 9238590 | Mirror elements for EUV lithography and production methods therefor | — | 2016-01-19 |
| 8964162 | Optical assembly | Damian Fiolka | 2015-02-24 |
| 8870396 | Substrates for mirrors for EUV lithography and their production | Julian Kaller, Michael Gerhard | 2014-10-28 |
| 8711332 | Mirror elements for EUV lithography and production methods therefor | — | 2014-04-29 |
| 8570488 | Transmitting optical element and objective for a microlithographic projection exposure apparatus | Michael Totzeck, Werner Mueller-Rissmann | 2013-10-29 |
| 8325426 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Susanne Beder +2 more | 2012-12-04 |
| 8163667 | Transmitting optical element with low foreign-element contamination | — | 2012-04-24 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Michael Totzeck, Susanne Beder, Heiko Feldmann, Daniel Kraehmer, Aurelian Dodoc | 2011-10-04 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Susanne Beder +2 more | 2011-07-19 |
| 7907347 | Optical composite material and method for its production | Eric Eva | 2011-03-15 |
| 7755839 | Microlithography projection objective with crystal lens | Karl-Heinz Schuster | 2010-07-13 |
| 7679721 | Projection objective of a microlithographic projection exposure apparatus and method for its production | — | 2010-03-16 |
| 6914248 | Particle-optical apparatus and method for operating the same | — | 2005-07-05 |