Issued Patents All Time
Showing 1–25 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143848 | Fixed focal length objective lens | — | 2021-10-12 |
| 10281824 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Vladimir Kamenov +4 more | 2019-05-07 |
| 9772478 | Catadioptric projection objective with parallel, offset optical axes | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2017-09-26 |
| 9726979 | Catadioptric projection objective with intermediate images | Wilhelm Ulrich, Alexander Epple | 2017-08-08 |
| 9632289 | Macro lens system and imaging apparatus | Ryoko TOMIOKA, Hiroki Saito, Michael POLLMANN, Juergen Klein | 2017-04-25 |
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun +4 more | 2016-11-15 |
| 9188771 | Reflective optical imaging system | Christoph Zaczek, Sascha Migura, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul | 2015-11-17 |
| 9182578 | Imaging optical system and illumination optical system | Hans-Juergen Mann, Johannes Zellner, Marco Pretorius, Christoph Menke, Wilhelm Ulrich +1 more | 2015-11-10 |
| 9134618 | Catadioptric projection objective with intermediate images | Wilhelm Ulrich, Alexander Epple | 2015-09-15 |
| 9128272 | Optical system for imaging an object | — | 2015-09-08 |
| 9097984 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Vladimir Kamenov +4 more | 2015-08-04 |
| 9057964 | Imaging optics and projection exposure installation for microlithography with an imaging optics | Hans-Juergen Mann, Johannes Zellner, Claus Zahlten, Christoph Menke, Marco Pretorius +2 more | 2015-06-16 |
| 9036772 | Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective | — | 2015-05-19 |
| 9019596 | Catadioptric projection objective with intermediate images | Wilhelm Ulrich, Alexander Epple | 2015-04-28 |
| 8913316 | Catadioptric projection objective with intermediate images | Wilhelm Ulrich, Alexander Epple | 2014-12-16 |
| 8908269 | Immersion catadioptric projection objective having two intermediate images | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2014-12-09 |
| 8873151 | Illumination system for a microlithgraphic exposure apparatus | Alexander Sohmer, Heiko Feldmann, Wilhelm Ulrich, Gerhard Fuerter, Rafael Egger +2 more | 2014-10-28 |
| 8858099 | Anamorphic objective | Christian Bannert, Vladan Blahnik, Holger Sehr | 2014-10-14 |
| 8804234 | Catadioptric projection objective including an aspherized plate | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2014-08-12 |
| 8780441 | Catadioptric projection objective with pupil correction | — | 2014-07-15 |
| 8773638 | Microlithographic projection exposure apparatus with correction optical system that heats projection objective element | Sascha Bleidistel, Olaf Conradi, Arif Kazi | 2014-07-08 |
| 8730572 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2014-05-20 |
| 8436985 | Combination stop for catoptric projection arrangement | Hans-Juergen Mann, Daniel Kraehmer, Toralf Gruner | 2013-05-07 |
| 8416490 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2013-04-09 |
| 8363315 | Catadioptric projection objective with mirror group | Alexander Epple, Wilhelm Ulrich, Hans-Juergen Mann, David Shafer | 2013-01-29 |