Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8355201 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2013-01-15 |
| 8339701 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2012-12-25 |
| 8289619 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2012-10-16 |
| 8212991 | Optical system of a microlithographic projection exposure apparatus | Albrecht Ehrmann, Sascha Bleidistel | 2012-07-03 |
| 8208198 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-26 |
| 8208199 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-26 |
| 8208127 | Combination stop for catoptric projection arrangement | Hans-Juergen Mann, Daniel Kraehmer, Toralf Gruner | 2012-06-26 |
| 8199400 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-12 |
| 8107162 | Catadioptric projection objective with intermediate images | Wilhelm Ulrich, Alexander Epple | 2012-01-31 |
| 8068276 | Projection objective for lithography | Heiko Feldmann, Susanne Beder, Alexander Epple, Hans-Juergen Rostalski | 2011-11-29 |
| 8064040 | Projection objective, projection exposure apparatus and reflective reticle for microlithography | Wilhelm Ulrich, Dieter Bader, Alexander Epple | 2011-11-22 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Michael Totzeck, Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer | 2011-10-04 |
| 7969663 | Projection objective for immersion lithography | Wilhelm Ulrich, Hans-Juergen Rostalski | 2011-06-28 |
| 7965453 | Projection objective and projection exposure apparatus including the same | Wilhelm Ulrich, Heiko Feldmann, Hans-Juergen Rostalski | 2011-06-21 |
| 7957069 | Projection optical system | Wilhelm Ulrich | 2011-06-07 |
| 7920338 | Reduction projection objective and projection exposure apparatus including the same | Wilhelm Ulrich | 2011-04-05 |
| 7869122 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2011-01-11 |
| 7848016 | High-NA projection objective | — | 2010-12-07 |
| 7835073 | Projection objective for lithography | Heiko Feldmann, Susanne Beder, Alexander Epple, Hans-Juergen Rostalski | 2010-11-16 |
| 7751129 | Refractive projection objective for immersion lithography | Wilhelm Ulrich, Hans-Juergen Rostalski | 2010-07-06 |
| 7738188 | Projection objective and projection exposure apparatus including the same | Wilhelm Ulrich, Heiko Feldmann, Hans-Juergen Rostalski | 2010-06-15 |
| 7712905 | Imaging system with mirror group | David Shafer, Alexander Epple, Hans-Juergen Mann | 2010-05-11 |
| 7697211 | Symmetrical objective having four lens groups for microlithography | David Shafer, Johannes Zellner, Heiko Feldmann, Wilhelm Ulrich, Holger Walter +3 more | 2010-04-13 |
| 7697198 | Catadioptric projection objective | David Shafer, Alexander Epple, Wilhelm Ulrich, Karl-Heinz Schuster | 2010-04-13 |
| 7679821 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2010-03-16 |