Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11650510 | Projection optical unit for microlithography and method for producing a structured component | Holger Muenz, Christoph Menke | 2023-05-16 |
| 11119413 | Imaging optical unit for imaging an object field into an image field | Johannes Ruoff, Susanne Beder, Alexander Wolf | 2021-09-14 |
| 10527832 | Imaging optical unit and projection exposure apparatus including same | Markus Schwab | 2020-01-07 |
| 10330903 | Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit | Alexander Wolf | 2019-06-25 |
| 10254653 | Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit | — | 2019-04-09 |
| 10139734 | Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unit | Alexander Epple, Ralf Mueller | 2018-11-27 |
| 10101668 | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same | Alexander Epple, Heiko Feldmann | 2018-10-16 |
| 9709494 | Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography | Johannes Bol | 2017-07-18 |
| 9291751 | Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit | Sascha Migura, Thomas Schicketanz | 2016-03-22 |
| 9086561 | Optical arrangement in a projection objective of a microlithographic projection exposure apparatus | Tilman Schwertner, Alexander Epple | 2015-07-21 |
| 9057964 | Imaging optics and projection exposure installation for microlithography with an imaging optics | Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke +2 more | 2015-06-16 |
| 8605257 | Projection system with compensation of intensity variations and compensation element therefor | Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann +2 more | 2013-12-10 |
| 8451458 | Imaging microoptics for measuring the position of an aerial image | Heiko Feldmann | 2013-05-28 |
| 8345350 | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same | Alexander Epple, Heiko Feldmann | 2013-01-01 |
| 8164759 | Imaging microoptics for measuring the position of an aerial image | Heiko Feldmann | 2012-04-24 |
| 8068276 | Projection objective for lithography | Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple | 2011-11-29 |
| 7969663 | Projection objective for immersion lithography | Aurelian Dodoc, Wilhelm Ulrich | 2011-06-28 |
| 7965453 | Projection objective and projection exposure apparatus including the same | Wilhelm Ulrich, Aurelian Dodoc, Heiko Feldmann | 2011-06-21 |
| 7834981 | Projection exposure apparatus, projection exposure method and projection objective | Heiko Feldmann, Wilhelm Ulrich | 2010-11-16 |
| 7835073 | Projection objective for lithography | Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple | 2010-11-16 |
| 7751129 | Refractive projection objective for immersion lithography | Aurelian Dodoc, Wilhelm Ulrich | 2010-07-06 |
| 7738188 | Projection objective and projection exposure apparatus including the same | Wilhelm Ulrich, Aurelian Dodoc, Heiko Feldmann | 2010-06-15 |
| 7570343 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hubert Holderer +6 more | 2009-08-04 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Alexander Epple, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster, Joerg Schultz +3 more | 2009-06-23 |
| 7532306 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich | 2009-05-12 |