Issued Patents All Time
Showing 1–25 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10606078 | Optical element | — | 2020-03-31 |
| 10345710 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Ulrich Loering +6 more | 2019-07-09 |
| 10337850 | Interferometric measuring arrangement | Jochen Hetzler, Sebastian Fuchs, Hans-Michael Stiepan | 2019-07-02 |
| 9436095 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Ulrich Loering +6 more | 2016-09-06 |
| 8786849 | Method for measuring an optical system | Thomas Korb, Christian Hettich, Michael Layh, Ulrich Wegmann, Matthias Manger | 2014-07-22 |
| RE44216 | Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection | Michael Totzeck, Heiko Feldmann, Toralf Gruner, Joern Greif-Wuestenbecker, Thomas Scheruebl +3 more | 2013-05-14 |
| 8330935 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Ulrich Loering +6 more | 2012-12-11 |
| 8325426 | Projection objective of a microlithographic projection exposure apparatus | Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder +2 more | 2012-12-04 |
| 8068279 | Optical system of an illumination device of a projection exposure apparatus | Juergen Hartmaier, Manfred Maul, Dieter Schmerek, Detlev Mueller, Otto Hahnemann +3 more | 2011-11-29 |
| 8049973 | Projection objective and method for optimizing a system aperture stop of a projection objective | — | 2011-11-01 |
| 8023104 | Microlithographic projection exposure apparatus | — | 2011-09-20 |
| RE42570 | Catadioptric objective | — | 2011-07-26 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder +2 more | 2011-07-19 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Udo Dinger +2 more | 2011-07-12 |
| 7787177 | High-NA projection objective with aspheric lens surfaces | — | 2010-08-31 |
| 7782538 | Projection objective having a high aperture and a planar end surface | Susanne Beder, Wolfgang Singer | 2010-08-24 |
| 7764427 | Microlithography optical system | — | 2010-07-27 |
| 7755839 | Microlithography projection objective with crystal lens | Wilfried Clauss | 2010-07-13 |
| 7751127 | Projection objective and method for optimizing a system aperture stop of a projection objective | — | 2010-07-06 |
| RE41350 | Catadioptric objective comprising two intermediate images | David Shafer, Alois Herkommer, Gerd Füerter, Rudolph Von Büenau, Wilhelm Ulrich | 2010-05-25 |
| 7697198 | Catadioptric projection objective | David Shafer, Alexander Epple, Aurelian Dodoc, Wilhelm Ulrich | 2010-04-13 |
| 7592598 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Udo Dinger +2 more | 2009-09-22 |
| 7570343 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer +6 more | 2009-08-04 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Johannes Wangler, Joerg Schultz +3 more | 2009-06-23 |
| 7532306 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski | 2009-05-12 |