Issued Patents All Time
Showing 51–75 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7186983 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Udo Dinger +2 more | 2007-03-06 |
| 7154677 | Projection objective for microlithography | — | 2006-12-26 |
| 7154676 | Very-high aperture projection objective | — | 2006-12-26 |
| 7154678 | Projection objective having adjacently mounted aspheric lens surfaces | David Shafer, Wilhelm Ulrich, Helmut Beierl, Wolfgang Singer | 2006-12-26 |
| 7130129 | Reticle-masking objective with aspherical lenses | Jurgen Grunwald, Johannes Wangler, Alexander Sohmer, Alexander Epple, Jorg Schultz | 2006-10-31 |
| 7113260 | Projection exposure system for microlithography and method for generating microlithographic images | Christian Wagner, Martin Schriever | 2006-09-26 |
| 7099087 | Catadioptric projection objective | — | 2006-08-29 |
| 7092069 | Projection exposure method and projection exposure system | — | 2006-08-15 |
| 7053988 | Optically polarizing retardation arrangement, and microlithography projection exposure machine | Michael Totzeck, Birgit Enkisch | 2006-05-30 |
| 7023627 | Lithographic objective having a first lens group including only lenses having a positive refractive power | Alexander Epple | 2006-04-04 |
| 7006595 | Illumination system particularly for microlithography | Wolfgang Singer, Jorg Schultz, Johannes Wangler, Udo Dinger, Martin Antoni +2 more | 2006-02-28 |
| 6996141 | Device for reducing the peak power of a pulsed laser light source | Harry J. Bauer, Eric Eva | 2006-02-07 |
| 6985286 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Wilhelm Ulrich | 2006-01-10 |
| 6972831 | Projection exposure system for microlithography and method for generating microlithographic images | Christian Wagner, Martin Schriever | 2005-12-06 |
| 6954316 | Projection objective | — | 2005-10-11 |
| 6950174 | Projection exposure system for microlithography and method for generating microlithographic images | Christian Wagner, Martin Schriever | 2005-09-27 |
| 6930758 | Projection exposure system for microlithography and method for generating microlithographic images | Christian Wagner, Martin Schriever | 2005-08-16 |
| 6903802 | Projection objective having adjacently mounted aspheric lens surfaces | David Shafer, Wilhelm Ulrich, Helmut Beierl, Wolfgang Singer | 2005-06-07 |
| 6891683 | Refractive projection objective with a waist | — | 2005-05-10 |
| 6885502 | Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement | — | 2005-04-26 |
| 6878916 | Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection system | — | 2005-04-12 |
| 6867923 | Projection lens, in particular for microlithography | Wolfgang Singer | 2005-03-15 |
| 6856379 | Polarizer and microlithography projection system with a polarizer | — | 2005-02-15 |
| 6855380 | Method for the production of optical components with increased stability, components obtained thereby and their use | — | 2005-02-15 |
| 6831794 | Objective with at least one aspheric lens | Frank Schillke, Franz-Josef Stickel, Alexander Epple | 2004-12-14 |