Issued Patents All Time
Showing 76–100 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6825913 | Reticle with crystal support material and pellicle | Christian Wagner | 2004-11-30 |
| 6806942 | Projection exposure system | Wilhelm Ulrich, Toralf Gruner, Daniel Kraehmer, Wolfgang Singer, Alexander Epple +2 more | 2004-10-19 |
| 6801364 | Projection objective for microlithography | — | 2004-10-05 |
| 6788387 | Lithographic objective having a first lens group including only lenses having a positive refractive power | Alexander Epple | 2004-09-07 |
| 6781668 | Optical arrangement | Hubert Holderer, Rudolf Von Bünau, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2004-08-24 |
| 6717722 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Wilhelm Ulrich | 2004-04-06 |
| 6683729 | Objective with crystal lenses and projection exposure equipment for microlithography | — | 2004-01-27 |
| 6646718 | Projection objective having adjacently mounted aspheric lens surfaces | David Shafer, Wilhelm Ulrich, Helmut Beierl, Wolfgang Singer | 2003-11-11 |
| 6631036 | Catadioptric objective | — | 2003-10-07 |
| 6600608 | Catadioptric objective comprising two intermediate images | David Shafer, Alois Herkommer, Gerd Furter, Rudolf Von Bünau, Wilhelm Ulrich | 2003-07-29 |
| 6597498 | Optical system for the vacuum ultraviolet | — | 2003-07-22 |
| 6597521 | Optical unit and method for making the same | — | 2003-07-22 |
| 6522484 | Projection objective | — | 2003-02-18 |
| 6516647 | Method of producing homokinetic joints | Manfred Hirschvogel, Peter Kettner, Walter Pischel, Michael Dahme, Hubert Nägele | 2003-02-11 |
| 6504597 | Optical arrangement | Hubert Holderer, Rudolf Von Bünau, Christian Wagner, Jochen Becker, Stefan Xalter +1 more | 2003-01-07 |
| 6496306 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Wilhelm Ulrich | 2002-12-17 |
| 6483573 | Projection exposure system and an exposure method in microlithography | — | 2002-11-19 |
| 6451462 | Optical unit and method for making the same | — | 2002-09-17 |
| 6438199 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Udo Dinger, Wolfgang Singer, Martin Antoni | 2002-08-20 |
| 6417974 | Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method | — | 2002-07-09 |
| 6392800 | Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement | — | 2002-05-21 |
| 6366410 | Reticular objective for microlithography-projection exposure installations | Jorg Schultz, Johannes Wangler | 2002-04-02 |
| 6349005 | Microlithographic reduction objective, projection exposure equipment and process | Helmut Beierl | 2002-02-19 |
| 6252712 | Optical system with polarization compensator | Gerhard Furter, Winfried Kaiser, Christian Wagner, Michael Gerhard | 2001-06-26 |
| 6198793 | Illumination system particularly for EUV lithography | Jorg Schultz, Johannes Wangler, Udo Dinger | 2001-03-06 |