Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11555783 | Method for detecting particles on the surface of an object, wafer, and mask blank | Oliver Beyer | 2023-01-17 |
| 10578783 | Optical grating and optical assembly for same | Sebastian Brueck, Vitaliy Shklover | 2020-03-03 |
| 10088754 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Gerhard-Wilhelm Ziegler +8 more | 2018-10-02 |
| 9618387 | Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatus | — | 2017-04-11 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Gerhard-Wilhelm Ziegler +8 more | 2017-03-28 |
| 9341953 | Microlithographic illumination system | Markus Deguenther, Michael Layh, Bruno Thome, Wolfgang Singer | 2016-05-17 |
| 9310693 | Method for operating a projection exposure tool and control apparatus | Bernd Doerband, Toralf Gruner | 2016-04-12 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Gerhard-Wilhelm Ziegler +8 more | 2016-03-08 |
| 9025131 | Optical beam deflecting element, illumination system including same, and related method | Daniel Runde, Florian Doll, Reinhard Voelkel, Kenneth Weible, Gundula Weiss | 2015-05-05 |
| 8870396 | Substrates for mirrors for EUV lithography and their production | Julian Kaller, Wilfried Clauss | 2014-10-28 |
| 8873023 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Gerhard-Wilhelm Ziegler +8 more | 2014-10-28 |
| 8705005 | Microlithographic illumination system | Markus Deguenther, Michael Layh, Bruno Thome, Wolfgang Singer | 2014-04-22 |
| 8520307 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more | 2013-08-27 |
| 8411251 | Optical element and illumination optics for microlithography | — | 2013-04-02 |
| 7961298 | Polarization rotator and a crystalline-quartz plate for use in an optical imaging system | — | 2011-06-14 |
| 7880969 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more | 2011-02-01 |
| 7382536 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Martin Brunotte +4 more | 2008-06-03 |
| 7294814 | Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same | Cristian Wagner, Gerald Richter | 2007-11-13 |
| 7271876 | Projection objective for microlithography | Wilhelm Ulrich, Gerhard Fuerter | 2007-09-18 |
| 7199864 | Polarization rotator and a crystalline-quartz plate for use in an optical imaging system | — | 2007-04-03 |
| 7180667 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Martin Brunotte +4 more | 2007-02-20 |
| 7145720 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Martin Brunotte +4 more | 2006-12-05 |
| 7126765 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Martin Brunotte +4 more | 2006-10-24 |
| 7112772 | Catadioptric projection objective with adaptive mirror and projection exposure method | Cristian Wagner, Gerald Richter | 2006-09-26 |
| 6936825 | Process for the decontamination of microlithographic projection exposure devices | Nils Dieckmann, Christine Sieler, Marcus Zehetbauer, Martin Schriever, Gerd Reisinger | 2005-08-30 |