Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12377877 | Device and method for scanning measurement of the distance to an object | — | 2025-08-05 |
| 12372622 | Apparatus and method for scanning ascertainment of the distance to an object | Peter Westphal | 2025-07-29 |
| 12127325 | Systems, devices, and methods for secondary particle suppression from a charge exchange device | Artem N. Smirnov, Vladislav Vekselman, Alexandr A. Ivanov, Michael Meekins, Blake Koop, Jr. | 2024-10-22 |
| 12111396 | Device and method for scanning frequency-modulated continuous wave (FMCW) LiDAR range measurement | Sandeep Ummethala, Naser Hosseini | 2024-10-08 |
| 11363708 | Negative ion-based beam injector | Yuri I. Belchenko, Alexander V. Burdakov, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets +4 more | 2022-06-14 |
| 11237254 | Device and method for scanning measurement of the distance to an object | — | 2022-02-01 |
| 11009593 | Device and method for scanning measurement of the distance to an object | — | 2021-05-18 |
| 10887976 | Negative ion-based beam injector | Yuri I. Belchenko, Alexander V. Burdakov, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets +4 more | 2021-01-05 |
| 10539883 | Illumination system of a microlithographic projection device and method for operating such a system | Markus Deguenther, Dirk Juergens, Thomas Korb | 2020-01-21 |
| 10398016 | Negative ion-based beam injector | Yuri I. Belchenko, Alexander V. Burdakov, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets +4 more | 2019-08-27 |
| 10274828 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Thomas Korb, Johannes Eisenmenger | 2019-04-30 |
| 10088754 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2018-10-02 |
| 9977334 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Thomas Korb, Johannes Eisenmenger | 2018-05-22 |
| 9924587 | Negative ion-based neutral beam injector | Yuri I. Belchenko, Alexander V. Burdakov, Gennady I. Dimov, Alexandr A. Ivanov, Valeery V. Kobets +4 more | 2018-03-20 |
| 9910359 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2018-03-06 |
| 9910360 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Thomas Korb, Johannes Eisenmenger | 2018-03-06 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2017-03-28 |
| 9591740 | Negative ion-based neutral beam injector | Yuri I. Belchenko, Alexander V. Burdakov, Gennady I. Dimov, Alexander A. Ivanov, Valeery V. Kobets +4 more | 2017-03-07 |
| 9535210 | Optical hollow waveguide assembly | Stefan Schmidt, Markus Deguenther | 2017-01-03 |
| 9500954 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-11-22 |
| 9310690 | Illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Thomas Korb, Frank Schlesener, Stefanie Hilt, Wolfgang Hoegele | 2016-04-12 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2016-03-08 |
| 8873023 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2014-10-28 |
| 8730455 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Axel Scholz, Markus Deguenther, Johannes Wangler | 2014-05-20 |
| 8004656 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Manfred Maul, Axel Scholz, Markus Deguenther, Johannes Wangler | 2011-08-23 |