Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444631 | Method of operating a microlithographic projection apparatus and illumination system of such an apparatus | Markus Deguenther, Stefanie Hilt, Thomas Korb, Frank Schlesener, Manfred Maul | 2019-10-15 |
| 10409167 | Method for illuminating an object field of a projection exposure system | Martin Endres, Stig Bieling, Markus Hauf, Lars Wischmeier, Fabian Haacker | 2019-09-10 |
| 10274828 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Vladimir Davydenko, Thomas Korb | 2019-04-30 |
| 10018803 | Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement | Jan Horn, Markus Holz, Joerg Specht, Stefan Krone | 2018-07-10 |
| 9977334 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Vladimir Davydenko, Thomas Korb | 2018-05-22 |
| 9915872 | Optical component | — | 2018-03-13 |
| 9910360 | Lighting system of a microlithographic projection exposure system and method for operating such a lighting system | Markus Deguenther, Vladimir Davydenko, Thomas Korb | 2018-03-06 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2018-02-20 |
| 9874819 | Mirror array | Stig Bieling, Markus Hauf, Lars Wischmeier, Fabian Haacker, Martin Endres | 2018-01-23 |
| 9563129 | Monitor system for determining orientations of mirror elements and EUV lithography system | Johannes Wangler, Markus Deguenther, Michael Patra | 2017-02-07 |
| 9535331 | Optical system for a microlithographic projection exposure apparatus | Michael Patra, Markus Schwab | 2017-01-03 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2016-01-19 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2015-04-07 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Damian Fiolka +6 more | 2012-12-25 |