Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12339589 | Digital micromirror device for an illumination optical component of a projection exposure system | — | 2025-06-24 |
| 11720028 | Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography | Thomas Fischer, Lars Wischmeier, Hubert Holderer | 2023-08-08 |
| 11350513 | Stop for arrangement in a constriction of an EUV illumination beam | — | 2022-05-31 |
| 11137688 | Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask | Johannes Ruoff | 2021-10-05 |
| 10928733 | Illumination optic for projection lithography | — | 2021-02-23 |
| 10928734 | Optical assembly for guiding an output beam of a free electron laser | — | 2021-02-23 |
| 10871717 | Optical system for a projection exposure apparatus | — | 2020-12-22 |
| 10802403 | Method for the microlithographic production of microstructured components | — | 2020-10-13 |
| 10678144 | Projection exposure method and projection exposure apparatus for microlithography | — | 2020-06-09 |
| 10514611 | Projection exposure method and projection exposure apparatus for microlithography | — | 2019-12-24 |
| 10310381 | Illumination system for EUV projection lithography | Ralf Mueller | 2019-06-04 |
| 10288894 | Optical component for use in a radiation source module of a projection exposure system | Alexander Wolf, Markus Schwab, Toralf Gruner, Joachim Hartjes | 2019-05-14 |
| 10216091 | Facet mirror for an illumination optical unit for projection lithography | Markus Deguenther | 2019-02-26 |
| 10191382 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2019-01-29 |
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2018-12-04 |
| 10133183 | Optical component | Markus Deguenther, Paul Buettner, Willi Heintel, Henner Baitinger | 2018-11-20 |
| 10126658 | Illumination optical unit for EUV projection lithography | — | 2018-11-13 |
| 10061203 | Beam distributing optical device and associated unit, system and apparatus | Markus Deguenther, Thomas Korb | 2018-08-28 |
| 10018917 | Illumination optical unit for EUV projection lithography | Stig Bieling, Martin Endres, Markus Deguenther, Johannes Wangler | 2018-07-10 |
| 10007193 | Projection exposure apparatus and method for controlling a projection exposure apparatus | Markus Deguenther | 2018-06-26 |
| 9989767 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Hans-Juergen Dobschal, Karsten Lindig, Guenter Rudolph, Ersun Kartal, Lisa Riedel +1 more | 2018-06-05 |
| 9989766 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Hans-Juergen Dobschal, Karsten Lindig, Guenter Rudolph, Ersun Kartal, Lisa Riedel +1 more | 2018-06-05 |
| 9983483 | Illumination system of a microlithographic projection exposure apparatus | Stig Bieling, Markus Deguenther, Frank Schlesener, Markus Schwab | 2018-05-29 |
| 9977333 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2018-05-22 |
| 9958783 | Illumination system for EUV projection lithography | Ralf Mueller | 2018-05-01 |