Issued Patents All Time
Showing 51–69 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9280061 | Illumination optical unit for EUV projection lithography | — | 2016-03-08 |
| 9261695 | Illumination system of a microlithographic projection exposure apparatus | — | 2016-02-16 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9213244 | Illumination system of a microlithographic projection exposure apparatus | Markus Schwab | 2015-12-15 |
| 9161426 | EUV light source | — | 2015-10-13 |
| 9046786 | Illumination system of a microlithographic projection exposure apparatus | Stig Bieling, Markus Deguenther, Frank Schlesener, Markus Schwab | 2015-06-02 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8896816 | Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source | — | 2014-11-25 |
| 8891057 | Microlithographic projection exposure apparatus | Michael Layh, Markus Deguenther, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2014-11-18 |
| 8854604 | Microlithographic projection exposure apparatus | Markus Deguenther, Andras G. Major | 2014-10-07 |
| 8724086 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2014-05-13 |
| 8724080 | Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus | — | 2014-05-13 |
| 8593645 | Microlithographic projection exposure apparatus and related method | — | 2013-11-26 |
| 8514372 | Method for setting an illumination geometry for an illumination optical unit for EUV projection lithography | — | 2013-08-20 |
| 8467031 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2013-06-18 |
| 8373847 | Polarization actuator | Martin Meier | 2013-02-12 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2012-12-25 |