Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12235094 | Confocal measuring apparatus for 3D measurement of an object surface | Korbinian Prause | 2025-02-25 |
| 10241416 | Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus | Markus Deguenther | 2019-03-26 |
| 10191382 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther | 2019-01-29 |
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2018-12-04 |
| 10114293 | Illumination system and projection objective of a mask inspection apparatus | Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller +1 more | 2018-10-30 |
| 9977333 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther | 2018-05-22 |
| 9933704 | Microlithography illumination optical system and microlithography projection exposure apparatus including same | Michael Patra, Markus Deguenther | 2018-04-03 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9658533 | Arrangement of a mirror | Johannes Ruoff, Heiko Feldmann | 2017-05-23 |
| 9599904 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther | 2017-03-21 |
| 9575414 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2017-02-21 |
| 9341953 | Microlithographic illumination system | Markus Deguenther, Michael Gerhard, Bruno Thome, Wolfgang Singer | 2016-05-17 |
| 9310692 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Ralf Stuetzle, Martin Endres, Jens Ossmann | 2016-04-12 |
| 9310694 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther | 2016-04-12 |
| 9304400 | Illumination system for EUV microlithography | Ralf Stuetzle, Damian Fiolka, Martin Endres, Holger Weigand | 2016-04-05 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2016-01-19 |
| 9217930 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul +4 more | 2015-12-22 |
| 9176390 | Method for adjusting an illumination system of a projection exposure apparatus for projection lithography | Markus Deguenther | 2015-11-03 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-21 |
| 9007559 | EUV collector with cooling device | Udo Dinger | 2015-04-14 |
| 9007563 | Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus | Markus Deguenther | 2015-04-14 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8891057 | Microlithographic projection exposure apparatus | Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2014-11-18 |
| 8786849 | Method for measuring an optical system | Thomas Korb, Christian Hettich, Ulrich Wegmann, Karl-Heinz Schuster, Matthias Manger | 2014-07-22 |