Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11303092 | Radiation source and device for feeding back emitted radiation to a laser source | — | 2022-04-12 |
| 11199780 | Reflective optical element for EUV lithography and method for adapting a geometry of a component | — | 2021-12-14 |
| 10261424 | Lithography apparatus and method for operating a lithography apparatus | Markus Holz, Ulrich Bihr | 2019-04-16 |
| 9997268 | EUV-mirror, optical system with EUV-mirror and associated operating method | Frederik Bijkerk, Muharrem Bayraktar, Oliver Dier | 2018-06-12 |
| 9996012 | Facet mirror for use in a projection exposure apparatus for microlithography | Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach | 2018-06-12 |
| 9448490 | EUV lithography system | Lars Wischmeier, Markus Hauf, Stephan Kellner, Igor Gurevich, Markus Deguenther | 2016-09-20 |
| 9442383 | EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method | Frederik Bijkerk, Muharrem Bayraktar, Oliver Dier | 2016-09-13 |
| 9444214 | Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system | — | 2016-09-13 |
| 9411241 | Facet mirror for use in a projection exposure apparatus for microlithography | Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach | 2016-08-09 |
| 9007559 | EUV collector with cooling device | Michael Layh | 2015-04-14 |
| 8976927 | Substrate for mirrors for EUV lithography | Claudia Ekstein, Johannes Lippert, Holger Maltor, Martin Weiser, Heiko Siekmann | 2015-03-10 |
| 8934085 | Bundle-guiding optical collector for collecting the emission of a radiation source | Christopher Weth | 2015-01-13 |
| 8710471 | Projection illumination system for EUV microlithography | Markus Hauf | 2014-04-29 |
| 8587767 | Illumination optics for EUV microlithography and related system and apparatus | Damian Fiolka, Berndt Warm, Christian Steigerwald, Martin Endres, Ralf Stuetzle +6 more | 2013-11-19 |
| 8253927 | Optical element with multiple primary light sources | — | 2012-08-28 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2011-07-12 |
| 7910900 | Collector for an illumination system | Ralf Stuetzle | 2011-03-22 |
| RE42118 | Projection system for EUV lithography | Russell Hudyma, Hans-Jurgen Mann | 2011-02-08 |
| 7623620 | Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm | Hans-Jurgen Mann, Wilhelm Ulrich, Wolfgang Reinecke, Thomas Engel, Axel Zibold +3 more | 2009-11-24 |
| 7592598 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2009-09-22 |
| 7557902 | Projection objective | Frank Eisert, Stefan Koehler, Andreas Ochse, Johannes Zellner, Martin Lowisch +1 more | 2009-07-07 |
| 7481543 | Mirror for use in a projection exposure apparatus | Frank Eisert, Siegfried Stacklies, Martin Weiser, Guenther Seitz | 2009-01-27 |
| 7456408 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2008-11-25 |
| 7443948 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Wolfgang Singer, Martin Antoni +2 more | 2008-10-28 |
| 7375798 | Projection system for EUV lithography | Russell Hudyma, Hans-Jurgen Mann | 2008-05-20 |