Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10634886 | Method for three-dimensionally measuring a 3D aerial image of a lithography mask | Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz | 2020-04-28 |
| 10606048 | Imaging optical unit for a metrology system for examining a lithography mask | Johannes Ruoff, Ralf Müller, Susanne Beder, Ulrich Matejka, Jens Timo Neumann | 2020-03-31 |
| 10068325 | Method for three-dimensionally measuring a 3D aerial image of a lithography mask | Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz | 2018-09-04 |
| 9110225 | Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type | Alois Herkommer | 2015-08-18 |
| 8854606 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Wolfgang Singer, Toralf Gruner, Olaf Dittmann, Michael Totzeck | 2014-10-07 |
| 8537460 | Reflective optical element and EUV lithography appliance | Johann Trenkler, Udo Nothelfer | 2013-09-17 |
| 7952797 | Reflective optical element and EUV lithography appliance | Johann Trenkler, Udo Nothelfer | 2011-05-31 |
| RE42118 | Projection system for EUV lithography | Russell Hudyma, Udo Dinger | 2011-02-08 |
| 7682031 | Catoptric objectives and systems using catoptric objectives | David Shafer, Wilhelm Ulrich | 2010-03-23 |
| 7623620 | Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm | Udo Dinger, Wilhelm Ulrich, Wolfgang Reinecke, Thomas Engel, Axel Zibold +3 more | 2009-11-24 |
| 7605905 | Method for distortion correction in a microlithographic projection exposure apparatus | Andreas Kirchner, Bernhard Kneer | 2009-10-20 |
| 7576934 | Groupwise corrected objective | Michael Schottner, Martin Lowisch | 2009-08-18 |
| 7572556 | Masks, lithography device and semiconductor component | Martin Lowisch, Wolfgang Singer | 2009-08-11 |
| 7375798 | Projection system for EUV lithography | Russell Hudyma, Udo Dinger | 2008-05-20 |
| 7372539 | Method for distortion correction in a microlithographic projection exposure apparatus | Andreas Kirchner, Bernhard Kneer | 2008-05-13 |
| 7355678 | Projection system for EUV lithography | Russell Hudyma, Udo Dinger | 2008-04-08 |
| 7221516 | Projection lens for a microlithographic projection exposure apparatus | Wolfgang Singer | 2007-05-22 |
| 7209286 | Objective with pupil obscuration | Wilhelm Ulrich | 2007-04-24 |
| 7190530 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Russell Hudyma, Alexander Epple | 2007-03-13 |
| 7177076 | 8-mirror microlithography projection objective | Wilhelm Ulrich, Gunther Seitz | 2007-02-13 |
| 7151592 | Projection system for EUV lithography | Russell Hudyma, Udo Dinger | 2006-12-19 |
| 7068436 | Projection lens for a microlithographic projection exposure apparatus | Toralf Gruner | 2006-06-27 |
| 6985210 | Projection system for EUV lithography | Russell Hudyma, Udo Dinger | 2006-01-10 |
| 6894834 | Objective with pupil obscuration | Wilhelm Ulrich | 2005-05-17 |
| 6867913 | 6-mirror microlithography projection objective | Udo Dinger, Michael Mühlbeyer | 2005-03-15 |