BK

Bernhard Kneer

CG Carl Zeiss Smt Gmbh: 11 patents #135 of 1,189Top 15%
AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
📍 Riedlingen, DE: #7 of 67 inventorsTop 15%
Overall (All Time): #413,181 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
10558126 Lithographic apparatus and method Jan Bernard Plechelmus Van Schoot, Sascha Migura 2020-02-11
10345710 Microlithographic projection exposure apparatus and measuring device for a projection lens Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more 2019-07-09
9696631 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system Markus Deguenther, Toralf Gruner 2017-07-04
9436095 Exposure apparatus and measuring device for a projection lens Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more 2016-09-06
9086637 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system Markus Deguenther, Toralf Gruner 2015-07-21
8330935 Exposure apparatus and measuring device for a projection lens Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more 2012-12-11
7719658 Imaging system for a microlithographical projection light system Andreas Dorsel, Toralf Gruner, Susanne Beder, Alexander Epple, Norbert Wabra 2010-05-18
7605905 Method for distortion correction in a microlithographic projection exposure apparatus Andreas Kirchner, Hans-Jurgen Mann 2009-10-20
7522260 Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components Andreas Kirchner, Hans-Juergen Mann 2009-04-21
7457043 Projection exposure system Gerald Richter 2008-11-25
7408621 Projection exposure system Gerald Richter 2008-08-05
7372539 Method for distortion correction in a microlithographic projection exposure apparatus Andreas Kirchner, Hans-Jurgen Mann 2008-05-13