Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10558126 | Lithographic apparatus and method | Jan Bernard Plechelmus Van Schoot, Bernhard Kneer | 2020-02-11 |
| 9568845 | Mirror for use in a microlithography projection exposure apparatus | Martin Rocktaeschel, Hartmut Enkisch, Franz-Josef Stickel, Oliver Natt, Hans-Juergen Mann | 2017-02-14 |
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun +4 more | 2016-11-15 |
| 9291751 | Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit | Hans-Juergen Rostalski, Thomas Schicketanz | 2016-03-22 |
| 9188771 | Reflective optical imaging system | Aurelian Dodoc, Christoph Zaczek, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul | 2015-11-17 |
| 9013678 | Projection objective having mirror elements with reflective coatings | Danny Chan, Hans-Juergen Mann | 2015-04-21 |
| 8486590 | Reflective mask for EUV lithography | Vladimir Kamenov | 2013-07-16 |
| 8279404 | Projection objective having mirror elements with reflective coatings | Danny Chan, Hans-Juergen Mann | 2012-10-02 |