Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10281824 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc +4 more | 2019-05-07 |
| 10042146 | Catadioptric projection objective | Alexander Epple, Toralf Gruner, Thomas Schicketanz | 2018-08-07 |
| 9921483 | Surface correction of mirrors with decoupling coating | Oliver Dier, Tobias Hackl, Franz-Josef Stickel, Ulrich Loering, Tilmann Assmus +2 more | 2018-03-20 |
| 9733395 | Microlithographic projection exposure apparatus | Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel +3 more | 2017-08-15 |
| 9726870 | Catadioptric projection objective | Alexander Epple, Toralf Gruner, Thomas Schicketanz | 2017-08-08 |
| 9279969 | Catadioptric projection objective | Alexander Epple, Toralf Gruner, Thomas Schicketanz | 2016-03-08 |
| 9097984 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc +4 more | 2015-08-04 |
| 9063439 | Projection objective for microlithography with stray light compensation and related methods | Aksel Goehnermeier, Daniel Kraehmer, Michael Totzeck | 2015-06-23 |
| 8873137 | Catadioptric projection objective | Alexander Epple, Toralf Gruner, Thomas Schicketanz | 2014-10-28 |
| 8486590 | Reflective mask for EUV lithography | Sascha Migura | 2013-07-16 |
| 8446665 | Catadioptric projection objective | Alexander Epple, Toralf Gruner, Thomas Schicketanz | 2013-05-21 |
| 8339576 | Projection objective of a microlithographic projection exposure apparatus | Ulrich Loering, Dirk Heinrich Ehm, Stefan Schmidt, Moritz Becker, Andreas Wurmbrand | 2012-12-25 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Michael Totzeck, Olaf Dittmann +3 more | 2011-06-14 |
| 7808615 | Projection exposure apparatus and method for operating the same | Toralf Gruner, Olaf Conradi, Nils Dieckmann, Markus Schwab, Olaf Dittmann +2 more | 2010-10-05 |
| 7456933 | Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus | Ulrich Wegmann, Thomas Muelders, Toralf Gruner, Markus Mengel | 2008-11-25 |
| 7355791 | Optical system and photolithography tool comprising same | Toralf Gruner | 2008-04-08 |
| 7321465 | Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses | Michael Totzeck, Toralf Gruner | 2008-01-22 |
| 7239450 | Method of determining lens materials for a projection exposure apparatus | Daniel Kraehmer, Michael Totzeck, Toralf Gruner, Aurelian Dodoc | 2007-07-03 |