Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405108 | Production method and measurement method | Hans-Michael Stiepan, Thomas Monz, Ulrich Loering | 2025-09-02 |
| 11194119 | Optical assembly having a thermally conductive component | Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder | 2021-12-07 |
| 10509336 | Optical assembly having a thermally conductive component | Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder | 2019-12-17 |
| 10281824 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Aurelian Dodoc, Vladimir Kamenov +4 more | 2019-05-07 |
| 10203607 | Optical element unit for exposure processes | Tilman Schwertner, Ulrich Bingel, Guido Limbach, Hans-Juergen Scherle, Jens Kugler +2 more | 2019-02-12 |
| 9703098 | Lens module comprising at least one exchangeable optical element | Guido Soyez, Stephan Back, Joachim Buechele, Guido Limbach, Harald Woelfle | 2017-07-11 |
| 9423695 | Lens module comprising at least one exchangeable optical element | Guido Soyez, Stephan Back, Joachim Buechele, Guido Limbach, Harald Woelfle | 2016-08-23 |
| 9097984 | Microlithography projection objective | Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Aurelian Dodoc, Vladimir Kamenov +4 more | 2015-08-04 |
| 9046795 | Optical element unit for exposure processes having sealing element | Tilman Schwertner, Ulrich Bingel, Guido Limbach, Hans-Juergen Scherle, Jens Kugler +2 more | 2015-06-02 |
| 8939587 | Lens module comprising at least one exchangeable optical element | Guido Soyez, Stephan Back, Joachim Buechele, Guido Limbach, Harald Woelfle | 2015-01-27 |
| 8870396 | Substrates for mirrors for EUV lithography and their production | Wilfried Clauss, Michael Gerhard | 2014-10-28 |
| 8376559 | Lens module comprising at least one exchangeable optical element | Guido Soyez, Stephan Back, Joachim Buechele, Guido Limbach, Harald Woelfle | 2013-02-19 |
| 8248578 | Projection exposure method and projection exposure system therefor | Toralf Gruner | 2012-08-21 |
| 8092029 | Lens module comprising at least one exchangeable optical element | Guido Soyez, Stephan Back, Joachim Buechele, Guido Limbach, Harald Woelfle | 2012-01-10 |
| 7659976 | Devices and methods for inspecting optical elements with a view to contamination | Herbert Fink, Christoph Zaczek, Wolfgang Rupp | 2010-02-09 |
| 7545483 | Optical element unit for exposure processes | Bernhard Gellrich, Jens Kugler, Thomas Schletterer, Guido Limbach, Hans-Juergen Scherle +2 more | 2009-06-09 |
| 7443500 | Apparatus for scattered light inspection of optical elements | — | 2008-10-28 |