Issued Patents All Time
Showing 1–25 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12332576 | Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography | Dirk Heinrich Ehm, Benjahman Julius Modeste, Marwene Nefzi | 2025-06-17 |
| 12287587 | Damping arrangement for vibration damping of an element in an optical system | Marwene Nefzi, Stefan Hembacher, David Schoenen | 2025-04-29 |
| 11314177 | Supporting an optical element | Bernhard Geuppert, Alexander Kharitonov | 2022-04-26 |
| 11281114 | Projection exposure apparatus for semiconductor lithography | Mark Feygin, Stefan Xalter, Bernhard Gellrich, Stefan Hembacher | 2022-03-22 |
| 10890850 | Optical imaging arrangement with actively adjustable metrology support units | Stefan Hembacher, Bernhard Geuppert | 2021-01-12 |
| 10754132 | Imaging optical system for microlithography | Olaf Rogalsky, Sonja Schneider, Boris Bittner, Bernhard Gellrich, Rolf Freimann | 2020-08-25 |
| 10599051 | Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus | Stefan Hembacher, Erik Loopstra, Bernhard Geuppert | 2020-03-24 |
| 10416570 | Optical imaging arrangement with a piezoelectric device | Stefan Hembacher, Michaela Schmid, Bernhard Geuppert, Burkhard Corves, Martin Riedel +5 more | 2019-09-17 |
| 10345710 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2019-07-09 |
| 10215948 | Optical element module with minimized parasitic loads | Ulrich Weber, Dirk Schaffer | 2019-02-26 |
| 10203607 | Optical element unit for exposure processes | Tilman Schwertner, Ulrich Bingel, Guido Limbach, Julian Kaller, Hans-Juergen Scherle +2 more | 2019-02-12 |
| 10197925 | Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner | Franz Sorg, Yim-Bun Patrick Kwan | 2019-02-05 |
| 10133021 | Positioning unit and apparatus for adjustment of an optical element | Ulrich Weber | 2018-11-20 |
| 9977228 | Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner | Franz Sorg, Yim-Bun Patrick Kwan | 2018-05-22 |
| 9904175 | EUV imaging apparatus | Stefan Hembacher, Michaela Schmid | 2018-02-27 |
| 9891535 | Optical projection system | Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Martin Mahlmann, Bernhard Geuppert +2 more | 2018-02-13 |
| 9817322 | Optical imaging device and method for reducing dynamic fluctuations in pressure difference | Stefan Hembacher, Bernhard Gellrich, Sascha Bleidistel | 2017-11-14 |
| 9810996 | Optical imaging device with thermal attenuation | Bernhard Gellrich, Thomas Ittner, Stefan Hembacher, Karl-Heinz Schimitzek, Payam Tayebati +1 more | 2017-11-07 |
| 9804500 | Optical imaging arrangement with simplified manufacture | Stefan Xalter, Jens Prochnau | 2017-10-31 |
| 9709895 | Support elements for an optical element | Ulrich Weber, Nicolai Wengert | 2017-07-18 |
| 9664873 | Positioning unit and apparatus for adjustment of an optical element | Ulrich Weber | 2017-05-30 |
| 9557653 | Optical projection system | Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Martin Mahlmann, Bernhard Geuppert +2 more | 2017-01-31 |
| 9436095 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2016-09-06 |
| 9250417 | Optical arrangement in a microlithographic projection exposure apparatus | Dirk Schaffer, Stefan Hembacher | 2016-02-02 |
| 9175948 | Optical module with a measuring device | Armin Schoeppach, Stefan Hembacher, Guido Limbach | 2015-11-03 |