Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12346033 | Optical system | Juergen Baier, Steffen Fritzsche | 2025-07-01 |
| 11892283 | Measuring apparatus for interferometrically determining a surface shape | Stefan Schulte | 2024-02-06 |
| 11426067 | Method and assembly for analysing the wavefront effect of an optical system | — | 2022-08-30 |
| 10948833 | Wafer holding device and projection microlithography system | — | 2021-03-16 |
| 10754132 | Imaging optical system for microlithography | Olaf Rogalsky, Sonja Schneider, Boris Bittner, Jens Kugler, Bernhard Gellrich | 2020-08-25 |
| 10386733 | Optical system | Juergen Baier, Steffen Fritzsche | 2019-08-20 |
| 10359703 | Method for aligning a mirror of a microlithographic projection exposure apparatus | Bernd Doerband, Jochen Hetzler | 2019-07-23 |
| 10345547 | Method for producing a lens for a lithography apparatus, and measurement system | Steffen Fritzsche, Juergen Baier | 2019-07-09 |
| 10101667 | Method for aligning a mirror of a microlithographic projection exposure apparatus | Bernd Doerband, Jochen Hetzler | 2018-10-16 |
| 10042271 | Projection exposure system for microlithography with a measurement device | Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Paul Kaufmann, Bernhard Geuppert | 2018-08-07 |
| 9996014 | Optical imaging device with image defect determination | Ulrich Wegmann | 2018-06-12 |
| 9720329 | Projection objective of a microlithographic projection exposure apparatus | Hartmut Enkisch, Stephan Muellender, Hans-Juergen Mann | 2017-08-01 |
| 9696639 | Projection exposure system for microlithography with a measurement device | Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Paul Kaufmann, Bernhard Geuppert | 2017-07-04 |
| 9575224 | Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective | Norman Baer, Guido Limbach, Thure Boehm, Gero Wittich | 2017-02-21 |
| 9568394 | Optical device | Heiko Feldmann | 2017-02-14 |
| 9482968 | Measuring system | Markus Goeppert, Helmut Haidner, Christoph Striebel | 2016-11-01 |
| 9377694 | Projection arrangement | Boris Bittner | 2016-06-28 |
| 9235131 | Optical imaging device with image defect determination | Ulrich Wegmann | 2016-01-12 |
| 9001304 | Projection exposure system for microlithography with a measurement device | Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Paul Kaufmann, Bernhard Geuppert | 2015-04-07 |
| 8908149 | Projection exposure system and use thereof | — | 2014-12-09 |
| 8822942 | Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area | — | 2014-09-02 |
| 8654345 | Optical system, in particular in a microlithographic projection exposure apparatus | Albrecht Hof, Dietmar Neugebauer | 2014-02-18 |
| 8593642 | Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device | Bernd Doerband, Stefan Schulte, Albrecht Hof, Frank Riepenhausen, Matthias Manger +3 more | 2013-11-26 |
| 8541752 | Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask | — | 2013-09-24 |
| 8537333 | Optical imaging device with image defect determination | Ulrich Wegmann | 2013-09-17 |