Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406777 | Optical element for a EUV projection exposure system | Sandro Hoffmann, Joern WEBER, Sebastian Strobel, Mirko Ribow, Christoph Nottbohm +2 more | 2025-09-02 |
| 11073765 | Method for producing a reflective optical element and reflective optical element | — | 2021-07-27 |
| 10916356 | Reflective optical element | Dmitry Kuznetsov, Andrey E. Yakshin, Viacheslav Medvedev, Frederik Bijkerk | 2021-02-09 |
| 10809625 | Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filter | Ulrich Mueller | 2020-10-20 |
| 10598921 | Mirror element, in particular for a microlithographic projection exposure apparatus | Martin Hermann, Christoph Nottbohm | 2020-03-24 |
| 10545323 | Projection optical unit for EUV projection lithography | Markus Schwab, Thomas Schicketanz | 2020-01-28 |
| 10520827 | Optical system, in particular for a microlithographic projection exposure apparatus | Thomas Schicketanz, Matus Kalisky, Oliver Dier | 2019-12-31 |
| 10423073 | Method for producing a mirror element | Peter Huber, Sebastian Strobel | 2019-09-24 |
| 10331048 | Mirror, in particular for a microlithographic projection exposure apparatus | Oliver Dier, Kerstin Hild, Matus Kalisky | 2019-06-25 |
| 10146136 | Reflecting coating with optimized thickness | Martin Endres, Stig Bieling | 2018-12-04 |
| 10061204 | Mirror, in particular for a microlithographic projection exposure apparatus | — | 2018-08-28 |
| 9915873 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | Hans-Jochen Paul, Thomas Schicketanz, Oliver Dier, Joern WEBER, Christian Grasse +2 more | 2018-03-13 |
| 9778576 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Michael Totzeck, Stephan Muellender | 2017-10-03 |
| 9720329 | Projection objective of a microlithographic projection exposure apparatus | Stephan Muellender, Hans-Juergen Mann, Rolf Freimann | 2017-08-01 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Boris Bittner, Martin von Hodenberg, Stephan Muellender, Olaf Conradi | 2017-03-28 |
| 9568845 | Mirror for use in a microlithography projection exposure apparatus | Martin Rocktaeschel, Franz-Josef Stickel, Oliver Natt, Hans-Juergen Mann, Sascha Migura | 2017-02-14 |
| 9341958 | Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror | Stephan Muellender, Martin Endres | 2016-05-17 |
| 9304405 | Microlithography illumination system and microlithography illumination optical unit | Damian Fiolka, Michael Totzeck, Stephan Muellender | 2016-04-05 |
| 9285515 | Imaging optical system and projection exposure system including the same | Hans-Juergen Mann, Wilheim Ulrich, Stephan Muellender | 2016-03-15 |
| 8605255 | Imaging optical system and projection exposure system including the same | Hans-Juergen Mann, Wilhelm Ulrich, Stephan Muellender | 2013-12-10 |
| 8457281 | Method for producing a multilayer coating, optical element and optical arrangement | Stephan Muellender, Martin Endres | 2013-06-04 |
| 8164077 | Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element | Marco Wedowski, Markus Weiss, Stephan Muellender, Johann Trenkler, Gisela Sipos +3 more | 2012-04-24 |
| 7672044 | Lens made of a crystalline material | Birgit Enkisch, Toralf Gruner | 2010-03-02 |
| 7646004 | Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element | Marco Wedowski, Markus Weiss, Stephan Müllender, Johann Trenkler, Gisela Sipos +3 more | 2010-01-12 |
| 7429116 | Projection objective and method for its manufacture | Hans-Juergen Mann, Stephan Muellender, Johann Trenkler | 2008-09-30 |