Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11980990 | Method for machining a workpiece in the production of an optical element | Manfred Matena, Marc Saitner, Robert Fichtl, Hans-Peter Brust | 2024-05-14 |
| 11213926 | Method for polishing a workpiece in the production of an optical element | Andreas Wolpert | 2022-01-04 |
| 10831114 | Lithography apparatus and method | Björn Liebaug, Jurgen Hofmann, Dietmar Dürr | 2020-11-10 |
| 10684551 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2020-06-16 |
| 10317802 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2019-06-11 |
| 10146138 | Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus | Kerstin Hild, Robert Fichtl, Joachim Hartjes | 2018-12-04 |
| 10031423 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2018-07-24 |
| 9921483 | Surface correction of mirrors with decoupling coating | Oliver Dier, Tobias Hackl, Ulrich Loering, Tilmann Assmus, Juergen Mueller +2 more | 2018-03-20 |
| 9746778 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2017-08-29 |
| 9568845 | Mirror for use in a microlithography projection exposure apparatus | Martin Rocktaeschel, Hartmut Enkisch, Oliver Natt, Hans-Juergen Mann, Sascha Migura | 2017-02-14 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2016-04-19 |
| 9249501 | Surface correction on coated mirrors | Dirk Heinrich Ehm, Juergen Mueller | 2016-02-02 |
| 8228483 | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | Ulrich Loering, Gerd Reisinger, Sonja Schneider, Johann Trenkler, Stefan Kraus +2 more | 2012-07-24 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster +3 more | 2009-06-23 |
| 6831794 | Objective with at least one aspheric lens | Karl-Heinz Schuster, Frank Schillke, Alexander Epple | 2004-12-14 |