Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12115841 | Ground milling machine | Thomas Thelen, Felix Franzen, Jeton Kelmendi | 2024-10-15 |
| 12025818 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Ricarda Schoemer | 2024-07-02 |
| 11489590 | Optical link and coherent receiver noise characterization | Jörg Leykauf, Israa Slim, Yi Tang | 2022-11-01 |
| 11415894 | Projection exposure system for semiconductor lithography having an optical arrangement | Judith Fingerhuth, Norbert Wabra, Ferdinand Djuric-Rissner, Peter Graf, Reimar Finken | 2022-08-16 |
| 11112543 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Ricarda Schoemer | 2021-09-07 |
| 10754132 | Imaging optical system for microlithography | Olaf Rogalsky, Boris Bittner, Jens Kugler, Bernhard Gellrich, Rolf Freimann | 2020-08-25 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Norbert Wabra +1 more | 2020-03-17 |
| 10401540 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Ricarda Schoemer | 2019-09-03 |
| 10061206 | Projection lens with wave front manipulator and related method and apparatus | Boris Bittner, Norbert Wabra, Ricarda Schoemer | 2018-08-28 |
| 10048592 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Norbert Wabra +1 more | 2018-08-14 |
| 10018907 | Method of operating a microlithographic projection apparatus | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Martin von Hodenberg | 2018-07-10 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Hendrik Wagner, Christian Wald +6 more | 2018-06-19 |
| 9939730 | Optical assembly | Walter Pauls, Hendrik Wagner, Florian Ahles, Christian Wald, Steffen Fritzsche +3 more | 2018-04-10 |
| 9910364 | Projection exposure apparatus including at least one mirror | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Stefan Rist | 2018-03-06 |
| 9829800 | System correction from long timescales | Boris Bittner, Norbert Wabra, Martin von Hodenberg, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Norbert Wabra, Martin von Hodenberg | 2017-11-14 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |
| 9470872 | Reflective optical element | Boris Bittner, Norbert Wabra, Ricarda Schneider, Hendrik Wagner, Rumen Iliew +1 more | 2016-10-18 |
| 9372411 | Projection objective of a microlithographic projection exposure apparatus | Johannes Zellner, Boris Bittner, Norbert Wabra, Martin von Hodenberg, Ricarda Schoemer +4 more | 2016-06-21 |
| 9348234 | Microlithographic apparatus | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Martin von Hodenberg, Hendrik Wagner +1 more | 2016-05-24 |
| 9134613 | Illumination and displacement device for a projection exposure apparatus | Norbert Wabra, Martin von Hodenberg, Boris Bittner, Ricarda Schneider | 2015-09-15 |
| 8228483 | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Johann Trenkler, Stefan Kraus +2 more | 2012-07-24 |