Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12025818 | Optical element having a coating for influencing heating radiation and optical arrangement | Norbert Wabra, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2024-07-02 |
| 11112543 | Optical element having a coating for influencing heating radiation and optical arrangement | Norbert Wabra, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2021-09-07 |
| 10754132 | Imaging optical system for microlithography | Olaf Rogalsky, Sonja Schneider, Jens Kugler, Bernhard Gellrich, Rolf Freimann | 2020-08-25 |
| 10474036 | Optical element and optical arrangement therewith | Hans-Jochen Paul, Norbert Wabra, Thomas Schicketanz | 2019-11-12 |
| 10401540 | Optical element having a coating for influencing heating radiation and optical arrangement | Norbert Wabra, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2019-09-03 |
| 10303063 | Projection exposure apparatus with at least one manipulator | Norbert Wabra, Martin von Hodenberg | 2019-05-28 |
| 10261425 | Projection exposure apparatus with a highly flexible manipulator | Alexander Wolf, Toralf Gruner, Norbert Wabra | 2019-04-16 |
| 10151922 | Wavefront correction element for use in an optical system | Matus Banyay, Martin Weiser | 2018-12-11 |
| 10061206 | Projection lens with wave front manipulator and related method and apparatus | Norbert Wabra, Sonja Schneider, Ricarda Schoemer | 2018-08-28 |
| 10054860 | Projection exposure apparatus with optimized adjustment possibility | Holger Walter, Matthias Roesch | 2018-08-21 |
| 10042265 | Lithographic projection objective | Olaf Rogalsky, Thomas Petasch, Jochen Haeussler | 2018-08-07 |
| 10018907 | Method of operating a microlithographic projection apparatus | Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Martin von Hodenberg | 2018-07-10 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Christian Wald +6 more | 2018-06-19 |
| 9939730 | Optical assembly | Walter Pauls, Hendrik Wagner, Florian Ahles, Christian Wald, Steffen Fritzsche +3 more | 2018-04-10 |
| 9927714 | Projection exposure apparatus with at least one manipulator | Stefan Rist | 2018-03-27 |
| 9910364 | Projection exposure apparatus including at least one mirror | Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Stefan Rist | 2018-03-06 |
| 9846367 | Projection exposure apparatus with at least one manipulator | Norbert Wabra, Martin von Hodenberg | 2017-12-19 |
| 9829800 | System correction from long timescales | Norbert Wabra, Martin von Hodenberg, Sonja Schneider, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Norbert Wabra, Martin von Hodenberg, Sonja Schneider | 2017-11-14 |
| 9760019 | Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus | Holger Walter | 2017-09-12 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Martin von Hodenberg, Hartmut Enkisch, Stephan Muellender, Olaf Conradi | 2017-03-28 |
| 9494868 | Lithographic projection objective | Olaf Rogalsky, Thomas Petasch, Jochen Haeussler | 2016-11-15 |
| 9470872 | Reflective optical element | Norbert Wabra, Sonja Schneider, Ricarda Schneider, Hendrik Wagner, Rumen Iliew +1 more | 2016-10-18 |
| 9423696 | Projection exposure apparatus with optimized adjustment possibility | — | 2016-08-23 |