Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12025818 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Sonja Schneider | 2024-07-02 |
| 11112543 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Sonja Schneider | 2021-09-07 |
| 11035536 | Illumination device for emitting illumination light | Jasmin Muster, Jenny Trommer, Oliver Hering, Jürgen Hager | 2021-06-15 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Norbert Wabra +1 more | 2020-03-17 |
| 10416569 | Attenuation filter for projection lens, projection lens having attenuation filter for projection exposure apparatus, and projection exposure apparatus having projection lens | Toralf Gruner | 2019-09-17 |
| 10401540 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Norbert Wabra, Holger Schmidt, Sonja Schneider | 2019-09-03 |
| 10183613 | Projection lamp for illumination | Juergen Hager, Stephan Schwaiger, Oliver Hering, Norbert Haas | 2019-01-22 |
| 10061206 | Projection lens with wave front manipulator and related method and apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider | 2018-08-28 |
| 10048592 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Norbert Wabra +1 more | 2018-08-14 |
| 10018907 | Method of operating a microlithographic projection apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider, Martin von Hodenberg | 2018-07-10 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Norbert Wabra, Sonja Schneider, Hendrik Wagner, Christian Wald +6 more | 2018-06-19 |
| 9939730 | Optical assembly | Walter Pauls, Hendrik Wagner, Florian Ahles, Christian Wald, Steffen Fritzsche +3 more | 2018-04-10 |
| 9910364 | Projection exposure apparatus including at least one mirror | Boris Bittner, Norbert Wabra, Sonja Schneider, Stefan Rist | 2018-03-06 |
| 9829800 | System correction from long timescales | Boris Bittner, Norbert Wabra, Martin von Hodenberg, Sonja Schneider, Ruediger Mack | 2017-11-28 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |
| 9372411 | Projection objective of a microlithographic projection exposure apparatus | Johannes Zellner, Boris Bittner, Norbert Wabra, Martin von Hodenberg, Sonja Schneider +4 more | 2016-06-21 |
| 9348234 | Microlithographic apparatus | Boris Bittner, Norbert Wabra, Sonja Schneider, Martin von Hodenberg, Hendrik Wagner +1 more | 2016-05-24 |