Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12025818 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2024-07-02 |
| 11415894 | Projection exposure system for semiconductor lithography having an optical arrangement | Judith Fingerhuth, Sonja Schneider, Ferdinand Djuric-Rissner, Peter Graf, Reimar Finken | 2022-08-16 |
| 11112543 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2021-09-07 |
| 10591825 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Ricarda Schoemer +1 more | 2020-03-17 |
| 10474036 | Optical element and optical arrangement therewith | Hans-Jochen Paul, Boris Bittner, Thomas Schicketanz | 2019-11-12 |
| 10401540 | Optical element having a coating for influencing heating radiation and optical arrangement | Boris Bittner, Holger Schmidt, Ricarda Schoemer, Sonja Schneider | 2019-09-03 |
| 10345710 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2019-07-09 |
| 10303063 | Projection exposure apparatus with at least one manipulator | Boris Bittner, Martin von Hodenberg | 2019-05-28 |
| 10261425 | Projection exposure apparatus with a highly flexible manipulator | Alexander Wolf, Toralf Gruner, Boris Bittner | 2019-04-16 |
| 10061206 | Projection lens with wave front manipulator and related method and apparatus | Boris Bittner, Sonja Schneider, Ricarda Schoemer | 2018-08-28 |
| 10048592 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Ricarda Schoemer +1 more | 2018-08-14 |
| 10018907 | Method of operating a microlithographic projection apparatus | Boris Bittner, Sonja Schneider, Ricarda Schoemer, Martin von Hodenberg | 2018-07-10 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Christian Wald +6 more | 2018-06-19 |
| 9977338 | Projection objective for a microlithographic projection exposure apparatus | Robert Eder | 2018-05-22 |
| 9964859 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer | 2018-05-08 |
| 9939730 | Optical assembly | Walter Pauls, Hendrik Wagner, Florian Ahles, Christian Wald, Steffen Fritzsche +3 more | 2018-04-10 |
| 9910364 | Projection exposure apparatus including at least one mirror | Boris Bittner, Sonja Schneider, Ricarda Schoemer, Stefan Rist | 2018-03-06 |
| 9846367 | Projection exposure apparatus with at least one manipulator | Boris Bittner, Martin von Hodenberg | 2017-12-19 |
| 9829800 | System correction from long timescales | Boris Bittner, Martin von Hodenberg, Sonja Schneider, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Martin von Hodenberg, Sonja Schneider | 2017-11-14 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Boris Bittner, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Boris Bittner, Martin von Hodenberg, Hartmut Enkisch, Stephan Muellender, Olaf Conradi | 2017-03-28 |
| 9588445 | Projection objective for a microlithographic projection exposure apparatus | Robert Eder | 2017-03-07 |
| 9470872 | Reflective optical element | Boris Bittner, Sonja Schneider, Ricarda Schneider, Hendrik Wagner, Rumen Iliew +1 more | 2016-10-18 |
| 9436095 | Exposure apparatus and measuring device for a projection lens | Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster +6 more | 2016-09-06 |