Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405104 | Measurement apparatus, method for measuring by interferometry, processing method, optical element and lithography system | Stefan Schulte, Martin Peschka | 2025-09-02 |
| 12008708 | Method and data processing system for creating or adapting individual images based on properties of a light ray within a lens | Michael Louis Wick, Christian Wojek, Torsten Sievers | 2024-06-11 |
| 10746975 | Objective lens for a still or film camera and method for selective damping of specific spatial frequency ranges of the modulation transfer function of such an objective lens | Marco Pretorius | 2020-08-18 |
| 10606032 | Optical lens-element system for a supplementary lens in front of a camera module of an electronic device | Oliver Schindelbeck | 2020-03-31 |
| 9964859 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2018-05-08 |
| 9316922 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2016-04-19 |
| 8879159 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2014-11-04 |
| 8858099 | Anamorphic objective | Aurelian Dodoc, Christian Bannert, Holger Sehr | 2014-10-14 |
| 8687290 | Variable filter compensation for high-aperture camera lenses | Dirk Jahn | 2014-04-01 |
| 8319945 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka | 2012-11-27 |
| 8126669 | Optimization and matching of optical systems by use of orientation Zernike polynomials | Michael Totzeck, Daniel Kraehmer, Ralf Mueller, Johannes Ruoff | 2012-02-28 |
| 8054557 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2011-11-08 |
| 7692868 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2010-04-06 |
| 7684013 | Lithographic apparatus and device manufacturing method | Steven George Hansen, Donis Flagello, Wolfgang Singer, Bernd Geh | 2010-03-23 |
| 7463423 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra | 2008-12-09 |