Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10281824 | Microlithography projection objective | Heiko Feldmann, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov +4 more | 2019-05-07 |
| 9964859 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2018-05-08 |
| 9955563 | EUV light source for generating a usable output beam for a projection exposure apparatus | Ingo Saenger, Manfred Maul, Christoph Hennerkes, Johannes Ruoff | 2018-04-24 |
| 9733395 | Microlithographic projection exposure apparatus | Vladimir Kamenov, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel +3 more | 2017-08-15 |
| 9645503 | Collector | Ingo Saenger, Joerg Zimmermann, Johannes Ruoff, Martin Meier, Frank Schlesener +2 more | 2017-05-09 |
| 9551941 | Illumination system for an EUV lithography device and facet mirror therefor | Johannes Ruoff, Ingo Saenger, Joerg Zimmermann, Christoph Hennerkes, Frank Schlesener | 2017-01-24 |
| 9535332 | Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask | Johannes Ruoff | 2017-01-03 |
| 9316922 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2016-04-19 |
| 9097984 | Microlithography projection objective | Heiko Feldmann, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov +4 more | 2015-08-04 |
| 9063439 | Projection objective for microlithography with stray light compensation and related methods | Aksel Goehnermeier, Vladimir Kamenov, Michael Totzeck | 2015-06-23 |
| 8922753 | Optical system for a microlithographic projection exposure apparatus | Ingo Saenger | 2014-12-30 |
| 8879159 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2014-11-04 |
| 8767181 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann +4 more | 2014-07-01 |
| 8456616 | Optical system for microlithography | Wilhelm Ulrich, Matthias Manger, Bernhard Gellrich | 2013-06-04 |
| 8436985 | Combination stop for catoptric projection arrangement | Hans-Juergen Mann, Aurelian Dodoc, Toralf Gruner | 2013-05-07 |
| 8345222 | High transmission, high aperture catadioptric projection objective and projection exposure apparatus | Ralf Mueller, Thomas Schicketanz, Wilhelm Ulrich, Alexander Epple | 2013-01-01 |
| 8325426 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss +2 more | 2012-12-04 |
| 8213079 | Polarization-modulating optical element and method for manufacturing thereof | Ralf Mueller | 2012-07-03 |
| 8208127 | Combination stop for catoptric projection arrangement | Hans-Juergen Mann, Aurelian Dodoc, Toralf Gruner | 2012-06-26 |
| 8126669 | Optimization and matching of optical systems by use of orientation Zernike polynomials | Michael Totzeck, Ralf Mueller, Johannes Ruoff, Vladan Blahnik | 2012-02-28 |
| 8054557 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Norbert Wabra | 2011-11-08 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system | Michael Totzeck, Susanne Beder, Wilfried Clauss, Heiko Feldmann, Aurelian Dodoc | 2011-10-04 |
| 7982969 | Projection objective of a microlithographic projection exposure apparatus | Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss +2 more | 2011-07-19 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement | Joern Greif-Wuestenbecker, Beate Boehme, Ulrich Stroessner, Michael Totzeck, Vladimir Kamenov +3 more | 2011-06-14 |
| 7903333 | Polarization-modulating optical element and method for manufacturing thereof | Ralf Mueller | 2011-03-08 |